Advances in CMP Polishing Technologies (inbunden)
Format
Inbunden (Hardback)
Språk
Engelska
Antal sidor
328
Utgivningsdatum
2011-12-20
Förlag
William Andrew
Medarbetare
Marinescu, Ioan D. / Kurokawa, Syuhei
Illustrationer
illustrations
Dimensioner
231 x 155 x 25 mm
Vikt
545 g
Antal komponenter
1
Komponenter
14:B&W 6 x 9 in or 229 x 152 mm Case Laminate on White w/Gloss Lam
ISBN
9781437778595
Advances in CMP Polishing Technologies (inbunden)

Advances in CMP Polishing Technologies

Inbunden Engelska, 2011-12-20
1099
Skickas inom 10-15 vardagar.
Fri frakt inom Sverige för privatpersoner.
Finns även som
Visa alla 1 format & utgåvor
CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge R&D accessible to the wider engineering community.

Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience.

Building on the fundamentals of tribology - the science of friction, wear and lubrication - the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries.

  • Demystifies scientific developments and technological innovations, opening them up for new applications and process improvements in the semiconductor industry and other areas of precision engineering
  • Explores stock removal mechanisms in CMP and polishing, and the challenges involved in predicting the outcomes of abrasive processes in high-precision environments
  • The authors bring together the latest innovations and research from the USA and Japan
Visa hela texten

Passar bra ihop

  1. Advances in CMP Polishing Technologies
  2. +
  3. Handbook of Ceramics Grinding and Polishing

De som köpt den här boken har ofta också köpt Handbook of Ceramics Grinding and Polishing av Toshiro Doi (häftad).

Köp båda 2 för 2248 kr

Kundrecensioner

Har du läst boken? Sätt ditt betyg »

Fler böcker av Toshiro Doi

Bloggat om Advances in CMP Polishing Technologies

Innehållsförteckning

Chapter 1: Introduction

Chapter 2: Device fabrication with a silicon crystal substrate

Chapter 3: Ultra-precision technology - taking silicon single crystal as an example

Chapter 4: Applications of ultra-precision CMP in device processes

Chapter 5: The future of processing technology

Chapter 6: Progress of the semiconductor and silicon industries

Chapter 7: Summary