Toivo T. Kodas – författare
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2 produkter
2 produkter
Inbunden, Engelska, 1999
3 805 kr
Skickas inom 5-8 vardagar
Unifying a wide range of materials synthesis techniques, 'Aerosol Processing of Materials' provides a detailed overview of the production of materials by the use of gas phase processes. Aerosol processes are responsible for the production of many of today's most advanced materials, especially in the semiconductor, optical waveguide, and thin film industries. Many of the unique properties of nanophase materials and composites are only possible through the application of acrosol in materials processing. This book describes various types of aerosol processes and the role of aerosols in materials processing. The work presents the advantages and disadvantages of each process in terms of cost, complexity, purity, and materials properties; and compares these factor to alternative methods of powder and film formation. The title provides the theory needed to understand and advance the fundamentals of this rapidly expanding material manufacturing processes. Written by well-respected leaders in the field, the book illuminates the roles of particle size characterization and size distributions; heat, mass, and momentum transfer; particle transport; condensation and evaporation; and coagulation and coalescence. 'Aerosol Processing of Materials' provides the most up-to-date and comprehensive single source of information available on gas-to-particle powder formation; liquid/solid-to-solid powder formation; film formation; reactor design; and particle/film characterization.
E-bok
PDF, Engelska, 20082 183 kr
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High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: ''I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.'' J. Am Chem. Soc.