Ernst Abbe's Theory of Image Formation in the Microscope

Häftad, Engelska, 2023

482 kr

Beställningsvara. Skickas inom 7-10 vardagar. Fri frakt över 249 kr.

Beskrivning

This book is an English translation of Die Lehre von der Bildentstehung im Mikroskop von Ernst Abbe, the only published detailed account of Abbe's theory of image formation in the microscope. The original German edition, written and published by Otto Lummer and Fritz Reiche in 1910, was an expanded version of the lectures given by Abbe in 1887. The book presents an introduction to geometrical optics, discusses image formation theory based on optical diffraction, and deals with optical images of several kinds of objects being illuminated on and off axis. It also introduces coherent imaging as two back-to-back diffraction processes and discusses the resolution limit of an imaging system. The book concludes with a discussion of the effect of artificial blocking of certain diffraction orders on the final image.This translation, which includes annotations and other added material, can serve as a self-study book for readers who wish to learn optics and optical image formation. It is also a tribute to the original authors' scientific achievements and devotion to the teaching and dissemination of precious knowledge.

Produktinformation

Utgivningsdatum:2023-12-30
Vikt:272 g
Format:Häftad
Språk:Engelska
Serie:Press Monographs
Antal sidor:244
Förlag:SPIE Press
ISBN:9781510655232

Utforska kategorier

Naturvetenskap:allmänt inom Naturvetenskap och teknik

Mer om författaren

Anthony Yen is Vice President and Head of Technology Development Center at ASML. He received BSEE from Purdue University and SM, EE, PhD, and MBA from MIT. After receiving his doctorate, he was Member of Technical Staff at Texas Instruments and was on assignment at IMEC. From 1997 to 2017, apart from three years at Cymer (now part of ASML), he was with TSMC where he first led the development of its lithography processes, making TSMC the first company to adopt 193-nm lithography in the manufacture of logic integrated circuits, and then co-led infrastructure development for next-generation-lithography technologies on assignment at SEMATECH; in his last ten years of career at TSMC, he led the development of EUV lithography, including its mask technology, for high-volume manufacturing. Yen is Fellow of SPIE and IEEE. He is a recipient of the Frits Zernike Award for Microlithography from SPIE and the Outstanding Electrical and Computer Engineer Award from Purdue University. He serves as a Distinguished Lecturer for the IEEE Electron Devices Society.Dr. Martin Burkhardt, Fellow Member, IBM Thomas J Watson Research Center.

Innehållsförteckning

Translators' forewordSpecial forewordPrefaceIntroduction1 Imaging laws of geometrical optics2 Imaging of self-luminous objects3 Imaging of illuminated objects4 Imaging of a grating with artificial clipping of diffraction ordersAppendixTranslators' notesA brief introduction to geometrical opticsOn the 0.5 ?/NA resolution limit in the imaging of periodic patternsIndex