Press Monographs – serie

Integral transform methods provide effective ways to solve a variety of problems arising in the engineering, optical and physical sciences. This concise, easy-to-follow reference text introduces the use of integral transforms, with a detailed discussion of the widely applicable Laplace and Fourier transforms. It is suitable as a self-study for practising engineers and applied mathematics, as well as a textbook for students in graduate-level courses in optics, engineering sciences, physics and mathematics. In most sections, applications relevant to engineers and applied scientists are used in place of formal proofs. Numerous examples, exercise sets, illustrations and tables enhance the book's usefulness as a teaching tool and reference.

This book examines the contrast sensitivity of the human visual system - concerning the eye's ability to distinguish objects from each other or from the background - and its effects on the imageforming process. The text provides equations for determining various aspects of contrast sensitivity, in addition to models that easily can be used for practical applications.

The charge-coupled device (CCD) has recently celebrated its 30th birthday. The remarkable invention of Boyle and Smith of Bell Labs has dramatically changed the course of imaging in disciplines ranging from astronomy to biotechnology. James R. Janesick, an early proponent of the Scientific CCD, presents a careful and comprehensive history, tutorial and state-of-the-art description of the CCD. The book provides valuable reference information to scientists, engineers and hardware managers involved with imaging CCDs and high-performance camera systems, as well as those who need a comprehensive introduction to the subject. ""Charge-Coupled Devices"" is both a history of this development and a comprehensive reference manual on CCD and camera design, fabrication, operation, characterization and optimization. The key processes of CCD operation - charge collection, charge transfer and charge measurement - are described physically and illustrated by experimental data. Standards for characterizing and optimizing CCDs are presented in detail and the ultimate physical limitations on performance parameters discussed. Worked examples throughout provide valuable tutorials, and give the reader an appreciation for the level of performance that is being achieved by today's CCDs.

The ever-increasing requirements of product quality and reliability demand more efficient measuring and testing methods that must be online, non-destructive, whole field, and without contact. Developed in the 1990s, shearography - also called speckle pattern shearing interferometry (SPSI) - is a coherent-optical measuring and testing method, similar to holographic interferometry. Unlike holography, however, shearography measures the gradient of the deformation rather than the deformation itself. Consequently, shearography can measure the strain information directly, increasing its importance as an industrial measuring tool. This work describes the development of second-generation digital shearography, which is effective in non-destructive testing (NDT), strain measurement, and vibration analysis due to its relative insensitivity to environmental disturbances.

The development of new technologies in the fields of photonics, digital systems and computers has resulted in many exciting innovations in high speed photography (HSP) and its commercial, industrial and military applications. This book forms a definitive work on the subject and was written to fill a hitherto uncovered gap in the available literature on this topic. Compiled by a leading team of international experts and written with the cooperation of the Association for High Speed Photography (AHSP) under the Editorship of Sidney F. Ray, this is the most authoritative work on the subject to date.The book forms an introduction to high speed photography, principally for those who wish to investigate its almost limitless potential as a tool for instrumentation, measurement and analysis in both research and development work. It will also interest those who are mainly concerned with standard photographic and digital imaging procedures but need to know more about high speed recording. As a university textbook it is ideally suited to those undertaking postgraduate research, as well as to undergraduates on courses that include film production, biomedical imaging, scientific photography and applied imaging.The material in the book follows progressively from an introduction to and development of HSP, to details of illumination and image capture systems, data extraction and necessary image processing in experimental procedures. Both major and specialist applications of HSP are detailed, including ballistics, the natural world, detonics, the properties of materials and aircraft engineering, combustion processes, motor vehicle safety and holography. A large number of diagrams and photographs illustrate and supplement the text while tables of data provide easy access to numerical information.Will appeal to newcomers as well as professionals in the topicEndorsed by the Association for High Speed PhotographyMajor topics covered in one independent source

Photon Transfer is designed for a wide audience - from the novice to the advanced user already familiar with the method. For first-time users, the book's primary purpose is to give sufficient guidelines to accurately generate, calibrate, and understand imaging data products through the photon transfer method.The book contains more than 230 figures that present experimental CCD and CMOS data products and modeling simulations connected to photon transfer. Contents also provide hundreds of relations that support photon transfer theory, simulations, and data.

This book addresses some of the issues in visual optics with a functional analysis of ocular aberrations, especially for the purpose of vision correction. The basis is the analytical representation of ocular aberrations with a set of orthonormal polynomials, such as Zernike polynomials or the Fourier series. Although the aim of this book is the application of wavefront optics to laser vision correction, most of the theories discussed are equally applicable to other methods of vision correction, such as contact lenses and intraocular lenses.

In its first update in 10 years, this text describes the characterization of all modern infrared imaging systems. In this new edition: the concept of target/background [DELTA]T (delta-T) with its dependence on background temperature is clarified; description of the three-dimensional noise model has been expanded with test methods plainly addressed; and, major updates were made to delineate Scanning and staring array methodologies in MTF measurement, and advantages and disadvantages of each are discussed.Although MRT test procedures have not changed very much over the years, observer variability is now well-documented in this title. All figures and graphs have been redrawn in this title. It is copublished with JCD Publishing.

This book provides a concise treatment of the chemical phenomena in lithography in a manner that is accessible to a general readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I of this book presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. ""Chemistry and Lithography"" is a useful reference for anyone working in the semiconductor industry.

Wave-optics simulation is an immensely useful tool for many applications. The simulation techniques in this book are directly applicable to atmospheric imaging, astronomy, adaptive optics, free-space optical communications, and LADAR. In addition, many of the basic techniques are applicable to integrated optics and nonlinear, anisotropic, and optically active media.Numerical Simulation of Optical Wave Propagation is solely dedicated to wave-optics simulations. The book discusses digital Fourier transforms (FT), FT-based operations, multiple methods of wave-optics simulations, sampling requirements, and simulations in atmospheric turbulence.This book will benefit optical scientists and engineers at all levels as a guide for FT-based data analysis, imaging system analysis, and wave-optics simulations. Professors can use this book to augment their Fourier optics courses and for independent studies with students. Problem sets are given at the end of each chapter. Students will learn principles and techniques from this book that can be utilized throughout their careers in optics. All readers will also benefit from the use of the MATLAB® scripting language and the code provided for the basic tools and examples used throughout the book.

Ten years have passed since the publication of the first edition of this classic text in April 2001. Considerable new material amounting to 100 pages has been added in this second edition. Each chapter now contains a Summary section at the end. The new material in Chapter 4 consists of a detailed comparison of Gaussian apodization with a corresponding beam, determination of the optimum value of the Gaussian radius relative to that of the pupil to yield maximum focal-point irradiance, detailed discussion of standard deviation, aberration balancing, and Strehl ratio for primary aberrations, derivation of the aberration-free and defocused OTF, discussion of an aberrated beam yielding higher axial irradiance in a certain defocused region than its aberration-free focal-point value, illustration that aberrated PSFs lose the advantage of Gaussian apodizaton in reducing the secondary maxima of a PSF, and a brief description of the characterization of the width of a multimode beam. In Chapter 5, the effect of random longitudinal defocus on a PSF is included. The coherence length of atmospheric turbulence is calculated for looking both up and down through the atmosphere. Also discussed are the angle of arrival of a light wave propagating through turbulence, and lucky imaging where better-quality short-exposure images are selected, aligned, and added to obtain a high-quality image.

Hyperspectral remote sensing is an emerging, multidisciplinary field with diverse applications that builds on the principles of material spectroscopy, radiative transfer, imaging spectrometry, and hyperspectral data processing. While there are many resources that suitably cover these areas individually and focus on specific aspects of the hyperspectral remote sensing field, this book provides a holistic treatment that captures its multidisciplinary nature.The content is oriented toward the physical principles of hyperspectral remote sensing as opposed to applications of hyperspectral technology. Readers can expect to finish the book armed with the required knowledge to understand the immense literature available in this technology area and apply their knowledge to the understanding of material spectral properties, the design of hyperspectral systems, the analysis of hyperspectral imagery, and the application of the technology to specific problems.

There is no more challenging setting for laser use than a research environment. In almost every other setting the laser controls count on engineering controls, and human exposure is kept to a minimum. In research, however, the user often manipulates the optical layout and thereby places him or herself in peril, but this does not mean that accidents and injury are unavoidable. On the contrary, laser accidents can be avoided by following a number of simple approaches. Laser Safety in the Lab provides the laser user and laser safety officer with practical guidelines from housekeeping to eyewear to on-the-job training.

Looking for a deeper understanding of electromagnetic wave propagation? Need a resource of practice problems to hone your skills? With 272 selected problems and answers, this study aid is a powerful supplement to the study of wave optics. Covering the basics of wave propagation, reflection, refraction, anisotropic media, interference, diffraction, and coherence, this question-and-answer collection provides the opportunity to solve problems chosen by a mentor with decades of experience instructing students. Whether you're a professor needing representative exam problems, a student learning the field of optics, or an experienced engineer looking for a better grasp of the field, you'll find this supplement of focused problems helpful.

The development of integrated optomechanical analysis tools has increased significantly over the past decade to address the ever-increasing challenges in optical system design, leveraging advances in computational capability. This book presents not only finite element modelling techniques specific to optical systems but also methods to integrate the thermal and structural response quantities into the optical model for detailed performance predictions.This edition updates and expands the content in the original SPIE Tutorial Text to include new illustrations and examples, as well as chapters about structural dynamics, mechanical stress, superelements, and the integrated optomechanical analysis of a telescope and a lens assembly.

This book provides a faithful and robust simulation of the optical and visual performances of the human eye for axial vision of distant objects in a variety of visual conditions. The author moves from intrinsically theoretical aspects (the optical and neurophysical models of the eye) to include a great number of experimental measurements from the scientific literature, in order to adapt the model parameters to the observed phenomenology and validate the predictivity power of the models themselves. The results are very satisfactory in terms of quantitative and qualitative adherence of model predictions to field measurements.Resulting from the author's investigations over the last decade, the book material is largely original, and the most relevant achievement can be found in the capacity to evaluate visual acuity for a range of visual conditions, such as variations in pupil size, refractive error, and ambient illumination.Thanks to the general organisation of the book, chapters and paragraphs with high level mathematical and physical optics content can be safely skipped without compromising the overall comprehension. To this end, a brief summary is provided at the end of each chapter, making this book appropriate for readers with greatly varying degrees of technical knowledge.|This book provides a faithful and robust simulation of the optical and visual performances of the human eye for axial vision of distant objects in a variety of visual conditions. The author moves from intrinsically theoretical aspects (the optical and neurophysical models of the eye) to include a great number of experimental measurements from the scientific literature, in order to adapt the model parameters to the observed phenomenology and validate the predictivity power of the models themselves. The results are very satisfactory in terms of quantitative and qualitative adherence of model predictions to field measurements. Resulting from the author's investigations over the last decade, the book material is largely original, and the most relevant achievement can be found in the capacity to evaluate visual acuity for a range of visual conditions, such as variations in pupil size, refractive error, and ambient illumination. Thanks to the general organisation of the book, chapters and paragraphs with high level mathematical and physical optics content can be safely skipped without compromising the overall comprehension. To this end, a brief summary is provided at the end of each chapter, making this book appropriate for readers with greatly varying degrees of technical knowledge.

Stray light is defined as unwanted light in an optical system, a familiar concept for anyone who has taken a photograph with the sun in or near their camera's field of view. In a low-cost consumer camera, stray light may be only a minor annoyance, but in a space-based telescope, it can result in the loss of data worth millions of dollars. It is imperative that optical system designers understand its consequences on system performance and adapt the design process to control it. This book addresses stray light terminology, radiometry, and the physics of stray light mechanisms, such as surface roughness scatter and ghost reflections. The most-efficient ways of using stray light analysis software packages are included. The book also demonstrates how the basic principles are applied in the design, fabrication, and testing phases of optical system development.

Maxwell's Equations of Electrodynamics: An Explanation is a concise yet complete discussion of Maxwell's four equations of electrodynamics-the fundamental theory of electricity, magnetism, and light. Written for a general audience, it guides readers step-by-step through the vector calculus (yikes!) and development of each equation. Pictures and diagrams illustrate what the equations mean in basic terms. The book not only provides a fundamental description of our universe but also explains how these equations predict the fact that light is better described as ""electromagnetic radiation.

This book provides all the essential and best elements of Kidger's many courses taught worldwide on lens and optical design. It is written in a direct style that is compact, logical, and to the point-a tutorial in the best sense of the word.

This text is intended for structural, mechanical, and optical engineers who wish to obtain an understanding of the principles of strength determination for optical components. Those who work with ground-, air-, or space-based systems, as well as with ceramics, semiconductors, and the like, will gain an understanding of fracture mechanics applications. This text expands basic fracture mechanics theory to include residual stress, which is rarely reported on in the literature and can have dramatic effects on lifetime. While complex equations are presented and a basic understanding of engineering principles is necessary, complex knowledge of fracture mechanics and energy principles is not required.

In this new edition of an SPIE bestseller, R. C. Olsen examines the definition and uses of remote sensing from a military perspective. The book discusses the instruments and principles that support a wide range of systems, including optical, thermal, radar, and LiDAR. Full-color images, as well as detailed examples and problems sets, make this a valuable textbook for students and engineers alike.

Since the publication of the first edition of the Handbook in 2002, optical methods for biomedical diagnostics have developed in many well-established directions, and new trends have also appeared. To encompass all current methods, the text has been updated and expanded into two volumes.Volume 1: Light - Tissue Interaction features eleven chapters, five of which focus on the fundamental physics of light propagation in turbid media such as biological tissues. The six following chapters introduce near-infrared techniques for the optical study of tissues and provide a snapshot of current applications and developments in this dynamic and exciting field. Topics include the scattering of light in disperse systems, the optics of blood, tissue phantoms, a comparison between time-resolved and continuous-wave methods, and optoacoustics.Volume 2: Methods begins by describing the basic principles and diagnostic applications of optical techniques based on detecting and processing the scattering, fluorescence, FT IR, and Raman spectroscopic signals from various tissues, with an emphasis on blood, epithelial tissues, and human skin. The second half of the volume discusses specific imaging technologies, such as Doppler, laser speckle, optical coherence tomography (OCT), and fluorescence and photoacoustic imaging.

This is an engineering treatise for mechanical engineers who design and analyze optical systems. It will also be of interest to other professionals working in the optics industry. The treatise is based on both the physical science and the practical realities of designing, analyzing, building, testing, and servicing real optical products.

Getting Started with UAV Imaging Systems: A Radiometric Guide provides the tools technologists need to begin designing or analyzing the data product of a UAV imager. Covering the basics of target signatures, radiometric propagation, electro-optical systems, UAV platforms, and image quality, it is replete with examples that promote immediate application of the concepts. Reference materials at the end of each chapter, including many links to current systems and platforms, offer further guidance for readers. Engineers and scientists who specify instrument requirements; design, build, or test hardware; or analyze images for commercial, scientific, and military applications will find the book a useful addition to their working library.

IC chip manufacturing processes, such as photolithography, etch, CVD, PVD, CMP, ion implantation, RTP, inspection, and metrology, are complex methods that draw upon many disciplines. Introduction to Semiconductor Manufacturing Technologies, Second Edition thoroughly describes the complicated processes with minimal mathematics, chemistry, and physics; it covers advanced concepts while keeping the contents accessible to readers without advanced degrees. Designed as a textbook for college students, this book provides a realistic picture of the semiconductor industry and an in-depth discussion of IC chip fabrication technology. The text focuses on current fabrication technologies, but older technologies are discussed for historical context.

Extreme ultraviolet lithography (EUVL) is the principal lithography technology—beyond the current 193-nm-based optical lithography—aiming to manufacture computer chips, and recent progress has been made on several fronts: EUV light sources, scanners, optics, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL used in the field.Since 2008, when SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for next-generation lithography. In 2008, EUVL was a prime contender to replace 193-nm-based optical lithography in leading-edge computer chip making, but not everyone was convinced at that point. Switching from 193-nm to 13.5-nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography—light source, scanner, mask, mask handling, optics, optics metrology, resist, computation, materials, and optics contamination. These challenges have been effectively resolved, and several leading-edge chipmakers have announced dates, starting in 2018, for inserting EUVL into high-volume manufacturing.This comprehensive volume comprises contributions from the world’s leading EUVL researchers and provides the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. This book is intended for people involved in one or more aspects of EUVL, as well as for students, who will find this text equally valuable.