Uzodinma Okoroanyanwu – författare
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3 produkter
3 produkter
Inbunden, Engelska, 2011
1 324 kr
Skickas inom 5-8 vardagar
This book provides a concise treatment of the chemical phenomena in lithography in a manner that is accessible to a general readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I of this book presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. ""Chemistry and Lithography"" is a useful reference for anyone working in the semiconductor industry.
Inbunden, Engelska, 2011
1 622 kr
Skickas inom 5-8 vardagar
Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.
Häftad, Engelska, 2023
1 349 kr
Skickas inom 5-8 vardagar
This volume explores the chemical basis of lithography, with the goal of deconstructing lithography into its essential chemical principles and to situate its various aspects in specific fields of chemistry. It is organized in five parts, comprising: lithographic process chemistry, lithographic materials chemistry, lithographic photo- and radiation chemistry, chemistry of lithographic imaging mechanisms, and lithographic process-induced chemistry.With the successful implementation of EUV lithography in manufacturing at the 10-nm and 7-nm technology nodes, patterning challenges have shifted from resolution to mostly noise and sensitivity. This is a regime where the resist suffers from increased stochastic variation and the attendant effects of shot noise—a consequence of the discrete nature of photons, which, at very low number per exposure pixel, show increased variability in the response of the resist relative to its mean. Noise in this instance is the natural variation in lithographic pattern placement, shape, and size. It causes line edge roughness, line width variation, and stochastic defects.Ultimately, these patterning issues have their origin in the materials used in lithography. Chemistry underpins the essence, functions, and properties of these materials. We therefore examine in the second volume of the present edition the role of stochastics in EUV lithography in far greater detail than we did in the first edition. Equally significant, the book develops a chemistry and lithography interaction matrix, which is used as a device to explore how various aspects and practices of photolithography (or optical lithography), electron-beam lithography, ion-beam lithography, EUV lithography, imprint lithography, directed self-assembly lithography, and proximal probe lithography derive from established chemical principles and phenomena.