Takayuki Ohba – författare
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4 produkter
Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications
Av Yosi Shacham-Diamand, Tetsuya Osaka m. fl.
Inbunden, 2009
1641 kr
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In Advanced ULSI interconnects – fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- scale integration (ULSI) technology for integrated circuit (IC) application. In- grated circuit technology is the base for all modern …
Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications
Av Takayuki Ohba, Madhav Datta m. fl.
E-bok, 2009
2065 kr
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In Advanced ULSI interconnects – fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- scale integration (ULSI) technology for integrated circuit (IC) application. In- grated circuit technology is the base for all modern …
Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications
Av Yosi Shacham-Diamand, Tetsuya Osaka m. fl.
Häftad, 2014
1641 kr
Lägg i varukorg
In Advanced ULSI interconnects – fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- scale integration (ULSI) technology for integrated circuit (IC) application. In- grated circuit technology is the base for all modern …
Advanced Metallization Conference 2001 (AMC 2001): Volume 17
Av Andrew J. McKerrow, Yosi Sacham-Diamand m. fl.
Inbunden, 2002
367 kr
Tillfälligt slut
Leading-edge advanced metallization schemes, as applied to VLSI interconnects, include the introduction of novel metals systems and novel dielectric materials. Technological advances highlighted at AMC 2001 include the latest developments in integrating copper metallization with low-dielectric …