GaAs material and crystal properties; GaAs devices; general process techniques; cleaning and cleanliness; wet etching; photolithography; nonoptical lithography; plasma processing equipment and plasma-assisted deposition; dry etching; plasma, RIE, RIBE, ion milling; specific process types; device isolation; ohmic contacts; schottky barriers and gate formation; first-level metal, dielectric formation, second-level metal; capacitors, inductors, and resistors.