CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155
Alexander A. Demkov, Bill Taylor, H. Rusty Harris, Jeffery W. Butterbaugh, Willy Rachmady
Häftad, 2014
445 kr
CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155
1 593 kr
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Beskrivning
To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.
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