Edward V. Barnat – författare

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3 produkter

1. 

   Pulsed and Pulsed Bias Sputtering

   Principles and Applications

   Av Edward V. Barnat, Toh-Ming Lu

   Inbunden, 2003

   1097 kr

   Lägg i varukorg

   Diffusion Barrier Stack - 5 nm -3 nm -2 nm :. . . -. . . . : . . O. 21-lm Figure 2: Schematic representing a cross-sectional view of the topography that is encountered in the processing of integrated circuits. (Not to scale) these sub-micron sized features is depicted in Fig. 2. The role of the …

2. 

   Pulsed and Pulsed Bias Sputtering

   Principles and Applications

   Av Edward V. Barnat, Toh-Ming Lu

   Häftad, 2014

   1097 kr

   Lägg i varukorg

   Diffusion Barrier Stack - 5 nm -3 nm -2 nm :. . . -. . . . : . . O. 21-lm Figure 2: Schematic representing a cross-sectional view of the topography that is encountered in the processing of integrated circuits. (Not to scale) these sub-micron sized features is depicted in Fig. 2. The role of the …

3. 

   Pulsed and Pulsed Bias Sputtering

   Principles and Applications

   Av Toh-Ming Lu, Edward V. Barnat

   E-bok, 2013

   1459 kr

   Lägg i varukorg

   Diffusion Barrier Stack - 5 nm -3 nm -2 nm :. . . -. . . . : . . O. 21-lm Figure 2: Schematic representing a cross-sectional view of the topography that is encountered in the processing of integrated circuits. (Not to scale) these sub-micron sized features is depicted in Fig. 2. The role of the …