T. -M. Lu – författare
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2 produkter
2 produkter
Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics - 2004
Häftad, Engelska, 2014
374 kr
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The scaling of device dimensions with a simultaneous increase in functional density has imposed tremendous challenges for materials, technology, integration and reliability of interconnects. To meet requirements of the ITRS roadmap, new materials are being introduced at a faster pace in all functions of multilevel interconnects. The issues addressed in this book cannot be dispelled as simply selecting a low-k material and integrating it into a copper damascene process. The intricacies of the back end for sub-100nm technology include novel processing of low-k materials, employing pore-sealing techniques and capping layers, introducing advanced dielectric and diffusion barriers, and developing novel integration schemes. This is in addition to concerns of performance, yield, and reliability appropriate to nanoscaled interconnects. Although many challenges continue to impede progress along the ITRS roadmap, the contributions in this book confront them head-on. It provides a scientific understanding of the issues and stimulate new approaches to advanced multilevel interconnects.
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Designed both for experimentalists who study rough surfaces and the dynamics of thin film growth using diffraction techniques and for theorists who wish to learn of such rough surfaces and dynamic behavior in Fourier space, this monograph quickly brings the readers to forefront research in the area of the dynamics of interface growth. Graduate and advanced undergraduate students as well as those readers who have very little prior knowledge of diffraction can pick up the subject matter with little difficulty.This monograph gives a brief review and summary at the end of each chapter. After the introduction of the elementary theory of diffraction in Chapter I, Chapter II discusses the various parameters and correlation functions that are essential in describing a rough surface. In Chapter III, the authors not only show analytical forms of the diffraction structure factor for both rough crystalline and non-crystalline surfaces, but also outline the methods of extracting the interface width, the lateral correlation length and the roughness parameter from the diffraction structure factor. To present the basic physical concepts underlying the scaling hypothesis during dynamic growth, in Chapter IV, a detailed description of the dynamic scaling properties of the height-height correlation function, the height difference function and the structure factor is given. The structure factor from a dynamic growth front is derived in Chapter V. An example of a quantitative measurement of the dynamic growth front of an epitaxial system is also given in this chapter. In Chapter VI, a particular type of rough surfaces having a diverging interface width associated with an equilibrium surface roughening transition is discussed. A comparison of the diffraction characteristics from divergent and non-divergent interface is also summarized.