Bokus
Kuan Yew Cheong, Behnam Akhavan, Shih-Nan Hsiao, Sheng-Chi Chen, Phuoc Huu Le - Plasma Processing for Semiconductor Materials and Thin-Film Devices, Häftad

Häftad, Engelska, 2026

Plasma Processing for Semiconductor Materials and Thin-Film Devices

Deposition, Surface Modification, and Etching

Av Kuan Yew Cheong, Behnam Akhavan, Shih-Nan Hsiao, Sheng-Chi Chen, Phuoc Huu Le

Del i serien Vacuum and Thin-Film Deposition Technologies

3338 kr

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Beskrivning
Plasma Processing for Semiconductor Materials and Thin-Film Devices covers the state-of-the-art in plasma processing of thin films. The book focuses on fundamental plasma theory, plasma for advanced applications, advanced characterization techniques, plasma and performance in semiconductor devices, and plasma processing. Sections consider the fundamental physics of plasma then move to advanced applications in the processing of semiconductor materials and their relation to the performance of semiconductor thin film devices. Subsequently, the book investigates the adoption of plasma for advanced (including thin film) characterization methods, finally addressing emerging plasma technologies such as liquid plasma, cold atmospheric plasma, and advanced plasma techniques.

This book will be of interest to students, researchers, and practitioners in any field that utilizes plasma processing, since its chapters have been written by leading authorities from both academia and industry.

  • Brings together in one volume the fundamental knowledge of thin-film growth at the atomic scale, the macroscopic concepts of thin-film growth, and the basic knowledge of plasma physics and chemistry
  • Covers state-of-the-art plasma technology for processing and characterizing advanced and emerging semiconductor materials and thin-film devices
  • Explores a wide range of plasma technologies for advanced engineering applications
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Mer om författaren

Kuan Yew Cheong is a Professor in the School of Materials and Mineral Resources Engineering at Universiti Sains Malaysia (USM). He specializes in semiconductor materials, electronic packaging, nanomaterials, and surface engineering, recognized as a top 2% researcher in applied physics/materials (2023). He has contributed to research on bio-organic-based memory to address e-waste.Behnam Akhavan is an Associate Professor of Biomedical Engineering at the University of Newcastle, Australia, where he heads the Plasma Bio-engineering Research Group. His Lab develops new plasma science and surface engineering solutions for a range of modern applications, including plasma surface engineering of bone implants, cardiovascular devices, and artificial nerves; plasma polymer nanoparticles for drug delivery; electrochromic coatings for wearable electronics; and micro/nano particles for toxin removal and water purification. Shih-Nan Hsiao is a Designated Professor at the Center for Low-temperature Plasma Sciences, Nagoya University, Japan. His research interests include cryogenic plasma etching, atomic layer etching, plasma diagnostics, and simulations for semiconductor processes.Sheng-Chi Chen is a Professor in the Department of Materials Engineering and Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, Taiwan. His research focuses on nanotechnology applications, particularly in the fields of information storage, transparent conductive oxide and nitride films, as well as magnetic films. He specializes in plasma and thin-film processes and analyses of nanomaterial thin films deposited via sputtering, evaporation, and atomic layer deposition (ALD) processes. Phuoc Huu Le is an Associate Professor at the Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, Taiwan. His research focuses on the development and characterization of thin films, including thermoelectric materials, topological insulators, transparent conducting oxides, metal oxides, and half-Heusler compounds. He is also deeply engaged in the fabrication of nanomaterials through plasma-based and physical-chemical methods, with applications spanning photochemical water splitting, electrochemical sensors, and nanophotocatalysts for the degradation of emerging pollutants and contaminants.

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