Vacuum and Thin-Film Deposition Technologies - Böcker

Fundamentals of Vacuum Science and System Design for High and Ultra-High Vacuum, Volume 1: Introduction to Vacuum and Systems details the important practical considerations in design of vacuum systems for various vacuum deposition technologies. Topics covered include: Introduction to vaccum and end uses, molecular density in vacuum, molecular flow in various vacuum regimes, characteristics of gas composition at various molecular densities, general principles of gas-solid interactions, vacuum pump technology, pressure sensors, leak detection and the impact of fundamental design decisions and operating practices on vacuum system performance. The introductory sections are designed to introduce the reader to basic concepts in vacuum technology. More detailed sections provide fundamental descriptions of basic vacuum pumps and pumping mechanisms in current practice and provides insight into the various pros and cons for each approach. System design, assembly, maintenance, and trouble-shooting are reviewed in detail. This volume also describes a wide range of pressure measurement approaches, and includes several key characterization techniques, example applications on systems for rough vacuum, high vacuum and ultra-high vacuum, as well as trade-offs in system design, allowing for the reader to develop an understanding of all the elements required for a successfully designed, assembled, and operating system.

Plasma Processing for Semiconductor Materials and Thin-Film Devices brings together the state-of-the art and the latest developments in the field of plasma processing of thin films. It focuses on fundamental plasma theory, plasma for advanced applications and advanced characterization techniques, plasma and performance of semiconductor devices, and plasma processing. The book provides an overdue investigation of the most recent developments in the area of plasma processing. It begins by considering the fundamental physics of plasma, then moves to advanced applications in processing of semiconductor materials and their relation to performance of semiconductor thin film devices. Subsequently it investigates the adoption of plasma for advanced (including thin film) characterization methods, and finally it addresses emerging plasma technologies such as liquid plasma, cold atmospheric plasma, and other advanced plasma techniques for thin film applications (such as energy, sensor, and environmental). This book will be of interest to students, researchers, and practitioners in any field that utilizes plasma processing, since its chapters have been written by leading authorities from both academia and industry.Brings together in one volume fundamental knowledge of thin film growth at the atomic scale, the macroscopic concepts of thin film growth, and the basic knowledge of plasma physics and chemistryCovers state-of-the-art plasma technology for processing and characterizing advanced and emerging semiconductor materials and thin film devicesExplores a wide range of plasma technologies for advanced engineering applications

Fundamentals of Vacuum Science and System Design for High and Ultrahigh Vacuum, Volume 2: Creating and Measuring Vacuum reviews the many specialized components that must be effectively integrated to create, support, and measure vacuum. This includes pipes, valves, flexible bellows, and several types of vacuum pumps, including rotary vane, dry scroll, turbomolecular, and cryogenic varieties. Pressure sensors are also reviewed with specific attention to their operating principles, pressure range, accuracy, reproducibility, and calibration. The unique features of various vacuum components are highlighted to aid in the selection of devices appropriate for specific pressure ranges and operating conditions. This volume informs the reader about critical vacuum components and how they can be integrated in a complete, dynamically pumped, vacuum system. The specific nuances related to pressure ranges and vacuum component characteristics are featured. Design considerations, such as vacuum gauge placement relative to active gas flows, pressure differentials, and pressure control approaches are also discussed.

Fundamentals of Vacuum Science and System Design for High and Ultrahigh Vacuum, Volume 1: Introduction to Vacuum and Systems details the important practical considerations in design of vacuum systems for various vacuum deposition technologies. Topics covered include an introduction to vacuum and end-uses, molecular density in vacuum, molecular flow in various vacuum regimes, characteristics of gas composition at various molecular densities, general principles of gas-solid interactions, vacuum pump technology, pressure sensors, leak detection, and the impact of fundamental design decisions and operating practices on vacuum system performance.The introductory sections are designed to introduce the reader to basic concepts in vacuum technology. More detailed sections provide fundamental descriptions of basic vacuum pumps and pumping mechanisms in current practice and provides insight into the various pros and cons for each approach. System design, assembly, maintenance, and trouble-shooting are reviewed in detail.The book also describes a wide range of pressure measurement approaches, and includes several key characterization techniques, example applications on systems for rough vacuum, high vacuum and ultrahigh vacuum, as well as trade-offs in system design. These perspectives will allow the reader to develop an understanding of all the elements required for a successfully designed, assembled, and operating system.Covers vacuum pump technology, taking a system from atmosphere down to high or ultra-high vacuumDiscusses the fundamental descriptions of vacuum pumps and pumping mechanisms in current practice and provides insight into the various pros and cons for each approachProvides an overview of practical vacuum system operating techniques that will ensure optimal performance and troubleshooting methods to identify system deficiencies

Smart Thin Films and Nanomaterials for the Fourth Industrial Revolution and Beyond provides an overview of various smart thin films and nanomaterials, offering detailed information on their synthesis, properties, and applications that utilize their interesting electrical, magnetic, and optical properties. The background and fundamentals of various types of smart materials are addressed throughout the book, in addition to important aspects such as the difficulty of processing control, optimization of sample synthesis, and materials design challenges. By providing insights into these functional materials, the book presents potential pathways for exploring novel phases, optimizing their properties, and tailoring them to suitable forms prior to prototype testing for a range of applications. Smart nanomaterials are notable for their advantages over other materials in the areas of cost, ease of processing, and tunable magnetic, electrical, and optical properties, and they show great promise for the development of the Fourth Industrial Revolution and beyond. From this perspective, the book focuses on different classes of smart nanomaterials targeting a broad spectrum of disciplines and applications - including engineering, medicine, biotechnology and materials science - that are all closely aligned with the ongoing evolution of Industry 4.0.Provides in-depth coverage of smart films and nanomaterials, with emphasis on advanced synthesis and fabrication methodsClearly discusses the relationships between composition, structure, and properties of functional materialsAddresses specific difficulties encountered in the development of nanomaterials such as process control and design challenges