Atomic Layer Deposition

Tommi Kääriäinen is a researcher at the Advanced Surface Technology Research Laboratory (ASTRaL) in Lappeenranta University of Technology (LUT), Finland. He has over nine years of experience in thin film deposition and analytical techniques. He has especially focused on atomic layer deposition (ALD) at low temperatures and recently on spatial and roll-to-roll ALD.David Cameron received his BSc in electrical and electronic engineering from the University of Glasgow in 1972. In 2004, he joined LUT as Professor of Material Technology and Director of ASTRaL. His research career has been in the area of thin film deposition and since joining ASTRaL, his work has focused on ALD. He has also worked on molecular beam epitaxy, plasma chemical vapour deposition, magnetron sputtering, and sol-gel deposition.Marja-Leena Kääriäinen has conducted ALD research for over 10 years. Her focus has been on the growth and structure of nanoscale metal oxide films. She has a particular interest in the photoactivity, photocatalytic activity, and antibacterial properties of ALD-grown thin films. Her background is in chemical engineering, which she studied at LUT and Michigan Technological University. Currently, she is a researcher at ASTRaL.Arthur Sherman has 60 years of industrial experience, which includes almost 20 years with General Electric, seven years on the corporate staff of RCA, several years at Applied Materials, and six years at Varian Associates. He earned a master's degree in aeronautical engineering at Princeton University and a PhD at the University of Pennsylvania. He has published extensively, including approximately 50 research papers published in archive journals and three scientific monographs.

• Acknowledgements ixForeword xiPreface xiii1 Fundamentals of Atomic Layer Deposition 11.1 Chemical Vapour Deposition 11.1.1 Thermal CVD 21.1.2 Plasma Enhanced CVD (PECVD) 51.2 Vapour Adsorption 61.3 Atomic Layer Deposition (ALD) 10References 292 Elemental Semiconductor Epitaxial Films 332.1 Epitaxial Silicon 33References 493 III-V Semiconductor Films 513.1 Gallium Arsenide 513.2 Other III-V Semiconductor Films 633.3 Applications 64References 654 Oxide films 674.1 Introduction 674.2 Aluminum Oxide 684.3 Titanium Dioxide 814.4 Zinc Oxide 964.5 Zirconium Dioxide 1014.6 Hafnium Dioxide 1074.7 Other Oxides 1124.8 Mixed Oxides and Nanolaminates 1244.9 Multilayers 150References 1515 Nitrides and Other Compounds 1615.1 Introduction 1615.2 Nitrides 1625.3 Chalcogenides 1765.4 Other Compounds 179References 1796 Metals 1836.1 Introduction 1836.2 Noble Metals 1846.3 Titanium 1936.4 Tantalum 1966.5 Aluminum 1986.6 Copper 2006.7 Other Transition Metals 203References 2047 Organic and Hybrid Materials 2077.1 Introduction 2077.2 Organic layers 2087.3 Hybrid Organic-inorganic Layers. 2097.4 Applications of Organic and Hybrid Films 212References 2138 ALD Applications and Industry 2158.1 Introduction 2158.2 MEMS/NEMS 2178.3 Thin Film Magnetic Heads 2238.4 Coating Nanoparticles, Nanomaterials and Porous Objects 2248.5 Optical Coatings 2268.6 Thin Film Electroluminescent Displays 2288.7 Solar Cells 2298.8 Anti-corrosion Layers 2318.9 Opportunities in Organic Electronics 2348.10 ALD Tool Manufacturers and Coating Providers 236References 238Index 243