Enrique del Castillo – författare

Although there are many Bayesian statistical books that focus on biostatistics and economics, there are few that address the problems faced by engineers. Bayesian Process Monitoring, Control and Optimization resolves this need, showing you how to oversee, adjust, and optimize industrial processes.Bridging the gap between application and development, this reference adopts Bayesian approaches for actual industrial practices. Divided into four parts, it begins with an introduction that discusses inferential problems and presents modern methods in Bayesian computation. The next part explains statistical process control (SPC) and examines both univariate and multivariate process monitoring techniques. Subsequent chapters present Bayesian approaches that can be used for time series data analysis and process control. The contributors include material on the Kalman filter, radar detection, and discrete part manufacturing. The last part focuses on process optimization and illustrates the application of Bayesian regression to sequential optimization, the use of Bayesian techniques for the analysis of saturated designs, and the function of predictive distributions for optimization.Written by international contributors from academia and industry, Bayesian Process Monitoring, Control and Optimization provides up-to-date applications of Bayesian processes for industrial, mechanical, electrical, and quality engineers as well as applied statisticians.

PROCESS OPTIMIZATION: A Statistical Approach is a textbook for a course in experimental optimization techniques for industrial production processes and other "noisy" systems where the main emphasis is process optimization. The book can also be used as a reference text by Industrial, Quality and Process Engineers and Applied Statisticians working in industry, in particular, in semiconductor/electronics manufacturing and in biotech manufacturing industries.

A comprehensive presentation of control theory for the SPC communityQuality control has become a major concern in today's competitive industrial environment, and industrial engineers are constantly seeking to make process adjustments that will optimize production efficiency and improve product quality. Statistical Process Adjustment for Quality Control fills the need for a comprehensive presentation of control theory at the elementary level, focusing on statistical methods used in process adjustment (Engineering Process Control Methods or EPC) and their relation to the classical methods of process monitoring, particularly those using SPC control charts. The author presents the severe effects of autocorrelated data on control chart performance and advocates the use of active adjustment methods for improving the quality of products and processes. He uses a detailed explanation of Deming's funnel experiment to illustrate the need for process adjustment when there are process dynamics, and presents an in-depth description of ARIMA models and Transfer Function models from a statistical point of view. He offers several adjustment strategies, including Minimum Variance Controllers, PID controllers, EWMA controllers, deadband policies, and constrained variance controllers. The book also offers integration strategies for SPC and EPC methods, discusses multivariate ARMAX models used for multivariate adjustment, and provides readers with a brief introduction to frequency domain and state-space methods.Statistical Process Adjustment for Quality Control is a timely resource for students, industrial engineers, and applied statisticians in both academic and industrial settings. Unique features include:* A strong focus on quality control of products and processes* Broad coverage of SPC, adjustments, and time series under one cover* Abundant examples using both real process data and simulations* Detailed explanations on how to use SAS and MATLAB on an accompanying ftp site* Coverage of spreadsheet simulation and optimization models in Microsoft(r) Excel* Numerous chapter problems and detailed bibliography of relevant literature for further reading

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

Although there are many Bayesian statistical books that focus on biostatistics and economics, there are few that address the problems faced by engineers. Bayesian Process Monitoring, Control and Optimization resolves this need, showing you how to oversee, adjust, and optimize industrial processes.Bridging the gap between application and dev

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry''s widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

Although there are many Bayesian statistical books that focus on biostatistics and economics, there are few that address the problems faced by engineers. Bayesian Process Monitoring, Control and Optimization resolves this need, showing you how to oversee, adjust, and optimize industrial processes.Bridging the gap between application and dev

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry''s widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

PROCESS OPTIMIZATION: A Statistical Approach is a textbook for a course in experimental optimization techniques for industrial production processes and other "noisy" systems where the main emphasis is process optimization. The book can also be used as a reference text by Industrial, Quality and Process Engineers and Applied Statisticians working in industry, in particular, in semiconductor/electronics manufacturing and in biotech manufacturing industries.