Harland G. Tompkins – författare

This book is specifically designed for the user who wishes expanded use of ellipsometry beyond the relatively limited number of turn-key applications. The book provides a concise discussion of theory and instrumentation before describing how to use optical parameters to determine material properties and optical parameters for inaccessible substrates and unknown films, and how to measure extremely thin films. The book also addresses polysilicon, a material commonly used in the microelectronics industry, and the effect of substrate roughness. This book''s concepts and applications are reinforced through the 14 case studies that illustrate specific applications of ellipsometry from the semiconductor industry as well as studies involving corrosion and oxide growth.- Allows the user to optimize turn-key operation of ellipsometers and move beyond limited turn-key applications- Provides comprehensive discussion of the measurement of film thickness and optical constants in film- Discusses the trajectories of the ellipsometric parameters Del and Psi and how changes in the materials affect the parameter- Includes 14 case studies to reinforce specific applications- Includes three appendices for helpful references

While single wave ellipsometry has been around for years, spectroscopic ellipsometry is fast becoming the method of choice for measuring the thickness and optical properties of thin films. This book provides the first practical introduction to spectroscopic ellipsometry and the related techniques of reflectometry. A guide for practitioners and researchers in a variety of disciplines, it addresses a broad range of applications in physics, chemistry, electrical engineering, and materials science.