Michael Nastasi – författare
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11 produkter
Ion Beam Analysis
Fundamentals and Applications
Av Michael Nastasi, James W. Mayer m. fl.
Häftad, 2019
1036 kr
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Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials …
Ion-Solid Interactions
Fundamentals and Applications
Av Michael Nastasi, James Mayer m. fl.
Inbunden, 1996
3453 kr
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Modern technology depends on materials with precisely controlled properties. Ion beams are a favoured method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition to …
Ion-Solid Interactions
Fundamentals and Applications
Av Michael Nastasi, James Mayer m. fl.
Häftad, 2004
1593 kr
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Modern technology depends on materials with precisely controlled properties. Ion beams are a favoured method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition to …
Mechanical Properties and Deformation Behavior of Materials Having Ultra-fine Microstructures
Proceedings of the NATO Advanced Study Institute, Porto Novo, Portugal, June 28-July 10, 1992
Av H. Gleiter, NATO Advanced Study Institute on Mechani m. fl.
Inbunden, 1993
873 kr
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This book focuses on the emerging class of new materials characterized by ultra-fine microstrucures. The NATO ASI which produced this book was the first international scientific meeting devoted to a discussion of the mechanical properties and deformation behavior of materials having grain sizes …
Ion Beam Analysis
Fundamentals and Applications
Av Yongqiang Wang, James W. Mayer m. fl.
E-bok, 2014
1266 kr
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Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials …
Ion Beam Analysis
Fundamentals and Applications
Av Michael Nastasi, James W. Mayer m. fl.
Inbunden, 2014
3143 kr
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Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials …
Ion Beam Analysis
Fundamentals and Applications
Av Yongqiang Wang, James W. Mayer m. fl.
E-bok, 2014
1266 kr
Lägg i varukorg
Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials …
Handbook of Modern Ion Beam Materials Analysis
Av Yongqiang Wang, Michael Nastasi
Inbunden, 2010
1434 kr
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The Handbook of Modern Ion Beam Materials Analysis, 2nd Edition is a compilation of updated techniques and data for use in the ion-beam analysis of materials. The information presented is unavailable collectively from any other source, and places a strong emphasis on practical examples of the …
Ion Implantation and Synthesis of Materials
Av Michael Nastasi, James W. Mayer
Inbunden, 2006
1098 kr
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Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of …
Ion Implantation and Synthesis of Materials
Av James W. Mayer, Michael Nastasi
E-bok, 2007
1459 kr
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Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of …
Ion Implantation and Synthesis of Materials
Av Michael Nastasi, James W. Mayer
Häftad, 2010
1084 kr
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Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of …
