Fundamental Aspects of Plasma Chemical Physics

Mario Capitelli, University of Bari, mario.capitelli@ba.imip.cnr.it Gianpiero Colonna, IMIP CNR Fabrizio Esposito, IMIP CNR Khaled Hassouni, Institut Galilee-Univeriste Paris Annarita Laricchiuta, IMIP CNR Savino Longo, University of Bari

"The work will be a valuable resource for researchers using many applications involving nonequilibrium cold plasmas such as plasma beams, etching, cleaning, deposition, surface activation, and gas lasers. ... Extensive references are provided, chapter-by-chapter, in addition to useful tables of reactions and processes with descriptions and references. ... Summing Up: Recommended. Graduate students, researchers/faculty, and professionals/practitioners." (T. Eastman, Choice, Vol. 53 (10), June, 2016)

• Electron-molecule cross sections and rates involving rotationally, vibrationally and electronically excited states.- Reactivity and relaxation of vibrationally/rotationally excited molecules with open shell atoms.- Formation of vibrationally and rotationally excited molecules during atom recombination on surfaces.- Collisional-radiative models for atomic plasmas.- Collisional-radiative models for molecular plasmas.- Kinetic and Monte Carlo approaches to solve Boltzmann equation for the electron energy distribution functions.- Non-equilibrium plasma kinetics under discharge and post-discharge conditions: coupling problems for low pressure and atmospheric cold plasmas.- Ion transport under strong fields.- PIC (Particle In Cell ) models for low-pressure plasmas.- Negative ion H- for fusion.- Non equilibrium plasma expansion through nozzles.