Bokus
Ion Implantation and Annealing Applications, Science and Technology

Inbunden, Engelska, 2026

Ion Implantation and Annealing Applications, Science and Technology

Av Wilfried Lerch, Michael Current

2537 kr

Skickas inom 10-15 vardagar

Beskrivning
This book compiles the insights and teachings from the 2024 IIT School lectures, offering a comprehensive look at ion implantation and annealing in semiconductor manufacturing. It covers the history of integrated circuits, common applications in CMOS technology, ion sources, radiation damage, annealing of materials like silicon (Si), silicon carbide (SiC) and gallium nitride (GaN), and advances in cluster ion beam technology. This edition, enriched by expert contributions, serves as an essential reference for students and professionals in materials science and microelectronics.
Produktinformation
  • Utgivningsdatum: 2026-05-30
  • Mått: 155 x 235 x 40 mm
  • Vikt: 1 113 g
  • Format: Inbunden
  • Språk: Engelska
  • Antal sidor: 628
  • Förlag: Springer Nature Switzerland AG
  • Serie: Topics in Applied Physics (del 156)
  • ISBN: 9783032100078
Utforska kategorier
Betyg & recensioner

0 recensioner

Inga recensioner tillgängliga.