Nicolas Posseme – författare
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3 produkter
Plasma Etching Processes for Interconnect Realization in VLSI
E-bok, 2015
1339 kr
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This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions.This book focuses on …
Plasma Etching Processes for CMOS Devices Realization
E-bok, 2017
899 kr
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Plasma etching has long enabled the perpetuation of Moore''s Law. Today, etch compensation helps to create devices that are smaller than 20 nm. But, with the constant downscaling in device dimensions and the emergence of complex 3D structures (like FinFet, Nanowire and stacked nanowire at longer …
Plasma Etching Processes for CMOS Devices Realization
Inbunden, 2017
719 kr
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Plasma etching has long enabled the perpetuation of Moore's Law. Today, etch compensation helps to create devices that are smaller than 20 nm. But, with the constant downscaling in device dimensions and the emergence of complex 3D structures (like FinFet, Nanowire and stacked nanowire at longer …
