Vivek Bakshi is the President of EUV Litho, Inc. He was previously a senior member of the technical staff of Sematech, Inc.Dr. Bakshi studied at the University of Texas at Austin; the University of Idaho; and the Indian Institute of Technology at Kanpur.

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• 1. EUV Lithography: A Historical Perspective / Hiroo Kinoshita and Obert Wood 2. EUV LLC: An Historical Perspective / Chuck Gwyn and Stefan Wurm3. EUV Source Technology / Vivek Bakshi4A. Optics and Multilayer Coatings for EUVL Systems / Regina Soufli, Saša Bajt, Russell M. Hudyma and John S. Taylor4B. Projection Systems for Extreme Ultraviolet Lithography / Russell M. Hudyma and Regina Soufli4C. Specification, Fabrication, Testing, and Mounting of EUVL Optical Substrates / John S. Taylor and Regina Soufli4D. Multilayer Coatings for EUVL / Regina Soufli and Saša Bajt5. EUV Optical Testing / Kenneth A. Goldberg6A. Optics Contamination / Saša Bajt6B. Grazing Angle Collector Contamination / Valentino Rigato6C. Normal Incidence (Multilayer) Collector Contamination / David N. Ruzic and Shailendra N. Srivastava7. EUV Mask and Mask Metrology / Han-Ku Cho and Jinho Ahn8. Photoresists for Extreme Ultraviolet Lithography / Robert L. Brainard9. High-Resolution EUV Imaging Tools for Resist Exposure and Aerial Image Monitoring / Malcolm Gower10. Fundamentals of the EUVL Scanner / Kazuya Ota11. EUVL System Patterning Performance / Patrick Naulleau, John E. Bjorkholm, and Manish Chandhok12. Lithography Cost of Ownership / Phil SeidelAppendix: Example Case Studies of Lithography CoO Calculations