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      ULSI Semiconductor Technology Atlas

      AvChih-Hang Tung,George T. T. Sheng

      Inbunden, Engelska, 2003

      2 756 kr

      Beställningsvara. Skickas inom 5-8 vardagar. Fri frakt över 249 kr.

      Beskrivning

      More than 1,100 TEM images illustrate the science of ULSI The natural outgrowth of VLSI (Very Large Scale Integration), Ultra Large Scale Integration (ULSI) refers to semiconductor chips with more than 10 million devices per chip. Written by three renowned pioneers in their field, ULSI Semiconductor Technology Atlas uses examples and TEM (Transmission Electron Microscopy) micrographs to explain and illustrate ULSI process technologies and their associated problems. The first book available on the subject to be illustrated using TEM images, ULSI Semiconductor Technology Atlas is logically divided into four parts:* Part I includes basic introductions to the ULSI process, device construction analysis, and TEM sample preparation * Part II focuses on key ULSI modules--ion implantation and defects, dielectrics and isolation structures, silicides/salicides, and metallization * Part III examines integrated devices, including complete planar DRAM, stacked cell DRAM, and trench cell DRAM, as well as SRAM as examples for process integration and development * Part IV emphasizes special applications, including TEM in advanced failure analysis, TEM in advanced packaging development and UBM (Under Bump Metallization) studies, and high-resolution TEM in microelectronics This innovative guide also provides engineers and managers in the microelectronics industry, as well as graduate students, with:* More than 1,100 TEM images to illustrate the science of ULSI* A historical introduction to the technology as well as coverage of the evolution of basic ULSI process problems and issues* Discussion of TEM in other advanced microelectronics devices and materials, such as flash memories, SOI, SiGe devices, MEMS, and CD-ROMs

      Produktinformation

      • Utgivningsdatum:2003-10-14
      • Mått:184 x 260 x 37 mm
      • Vikt:1 370 g
      • Format:Inbunden
      • Språk:Engelska
      • Antal sidor:680
      • Förlag:John Wiley & Sons Inc
      • ISBN:9780471457725

      Utforska kategorier

      • Elektronik och kommunikationer inom Naturvetenskap och teknik

      Mer om författaren

      CHIH-HANG TUNG is a senior member of the technical staff and Project Leader at the Institute of Microelectronics in Singapore. GEORGE T. T. SHENG was the first to develop cross-sectioning samples of TEM studies of semiconductor devices and has been involved with many other groundbreaking projects at Bell Labs.CHIH-YUAN LU is Chairman and CEO of Ardentec Corp., an ULSI testing service company. He is also CTO of Macronix International Co., Ltd., the eighth largest worldwide NVM semiconductor company.

      Recensioner i media

      "...provides a historical introduction to the technology as well as coverage of the evolution of basic ULSI process problems and issue." (IEEE Solid-State Circuits Society Newsletter, January 2004) "…strongly recommended…" (E-Streams, Vol. 7, No. 4)

      Innehållsförteckning

      • FOREWORD ixPREFACE xiPART I 11 Microelectronics and Microscopy 32 ULSI Process Technology 363 Applications of TEM for Construction Analysis 614 TEM Sample Preparation Techniques 90PART II 1415 Ion Implantation and Substrate Defects 1436 Dielectrics and Isolation 1797 Silicides, Polycide, and Salicide 2568 Metallization and Interconnects 287PART III 3439 ULSI Devices I: DRAM Cell with Planar Capacitor 34510 ULSI Devices II: DRAM Cell with Stacked Capacitor 36511 ULSI Devices III: DRAM Cell with Trench Capacitor 39912 ULSI Devices IV: SRAM 445PART IV 47513 TEM in Failure Analysis 47714 Novel Devices and Materials 52615 TEM in Under Bump Metallization (UBM) and Advanced Electronics Packaging Technologies 55816 High-Resolution TEM in Microelectronics 609INDEX 647
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