Spacer Engineered FinFET Architectures

High-Performance Digital Circuit Applications

AvPankaj Kumar Pal,Brajesh Kumar Kaushik

E-bok
PDF, Engelska, 2017

844 kr

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This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.

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