Trace Analysis of Semiconductor Materials is a guidebook concerned with procedures of ultra-trace analysis. This book discusses six distinct techniques of trace analysis. These techniques are the most common and can be applied to various problems compared to other methods. Each of the four chapters basically includes an introduction to the principles and general statements. The theoretical basis for the technique involved is then briefly discussed. Practical applications of the techniques and the different instrumentations are explained. Then, the applications to trace analysis as pertaining to semiconductor materials are discussed. Chapter 1 discusses radiochemical practice, the analysis of semiconductor materials, separation techniques, several qualitative radiochemical schemes, radiochemical purification procedures, and several earlier reported studies. Chapter 2 covers emission spectroscopy, including its potential for future applications. Discussions in Chapter 3 explain the benefits of each of the four mass spectrometric methods, namely, the isotope dilution method, complete thermal vaporization, vacuum spark technique, and the ion bombardment method. Chapter 4 focuses on the absorption, fluorescence, and polarographic methods used in general trace analysis, including examples of semiconductor material applications and other problems that result when certain impurities are introduced into the test sample. This monograph will be useful for researchers in ultra-trace analysis, nuclear physics, and analytical chemistry.
