Treatise on Materials Science and Technology, Volume 28: Glass IV covers the developments in glass science and technology. The book discusses the use of silicon dioxide films in semiconductor devices; the nuclear waste glasses; and the synthesis and properties of oxynitride glasses. The text also describes the preparation, the properties, and the applications of heavy-metal fluoride glasses; and an analytical model of viscoelasticity in seals. Materials scientists and materials engineers will find the book invaluable.

Treatise on Materials Science and Technology, Volume 28: Glass IV covers the developments in glass science and technology. The book discusses the use of silicon dioxide films in semiconductor devices; the nuclear waste glasses; and the synthesis and properties of oxynitride glasses. The text also describes the preparation, the properties, and the applications of heavy-metal fluoride glasses; and an analytical model of viscoelasticity in seals. Materials scientists and materials engineers will find the book invaluable.

Treatise on Materials Science and Technology, Volume 28: Glass IV covers the developments in glass science and technology. The book discusses the use of silicon dioxide films in semiconductor devices; the nuclear waste glasses; and the synthesis and properties of oxynitride glasses. The text also describes the preparation, the properties, and the applications of heavy-metal fluoride glasses; and an analytical model of viscoelasticity in seals. Materials scientists and materials engineers will find the book invaluable.