Select Guide Rating

• Foreword (Feldman); Introduction (Vijay Narayanan, Martin M Frank and Alex Demkov); Semiconductors on Si:Current Trends in Group-IV Semiconductor Epitaxy for Nanoelectronics (Jean-Michel Hartmann); Silicon Carbide on Silicon: 3C-SiC Buffer Layers for GaN LEDs (Jessica Chai, Li Wang and Sima Dimitrijev); Epitaxy of GaN on Silicon (Yu Cao, Satyaki Ganguly, Grace (Huili) Xing and Debdeep Jena); III-V Semiconductors on Silicon: Arsenides and Phosphides for QWFETs and BJTs (Dmitri Lubyshev); Dielectrics on Si:Organosilicates on Si: Low-k Dielectrics for MOSFET Interconnect Insulation (Mikhail R Baklanov, Kris Vanstreels, Chen Wu, Yunlong Li and Kristof Croes); Silicon Nitride on Si: Electronic Structure of Traps for Flash Memory (Vladimir A Gritsenko); High-k Oxides on Si: MOSFET Gate Dielectrics (Takashi Ando, Unoh Kwon, Siddarth Krishnan, Martin M Frank and Vijay Narayanan); Materials for DRAM Memory Cell Applications (Uwe Schroeder and Stefan Slesazeck); Electro-Optically Active Oxides on Silicon for Photonics (Stefan Abel and Jean Fompeyrine); Metals on Si:Silicides on Si: MOSFET Contacts (Ahmet S Ozcan);

Select Guide Rating

• Foreword (Feldman); Introduction (Vijay Narayanan, Martin M Frank and Alex Demkov); Semiconductors on Si:Current Trends in Group-IV Semiconductor Epitaxy for Nanoelectronics (Jean-Michel Hartmann); Silicon Carbide on Silicon: 3C-SiC Buffer Layers for GaN LEDs (Jessica Chai, Li Wang and Sima Dimitrijev); Epitaxy of GaN on Silicon (Yu Cao, Satyaki Ganguly, Grace (Huili) Xing and Debdeep Jena); III-V Semiconductors on Silicon: Arsenides and Phosphides for QWFETs and BJTs (Dmitri Lubyshev); Dielectrics on Si:Organosilicates on Si: Low-k Dielectrics for MOSFET Interconnect Insulation (Mikhail R Baklanov, Kris Vanstreels, Chen Wu, Yunlong Li and Kristof Croes); Silicon Nitride on Si: Electronic Structure of Traps for Flash Memory (Vladimir A Gritsenko); High-k Oxides on Si: MOSFET Gate Dielectrics (Takashi Ando, Unoh Kwon, Siddarth Krishnan, Martin M Frank and Vijay Narayanan); Materials for DRAM Memory Cell Applications (Uwe Schroeder and Stefan Slesazeck); Electro-Optically Active Oxides on Silicon for Photonics (Stefan Abel and Jean Fompeyrine); Metals on Si:Silicides on Si: MOSFET Contacts (Ahmet S Ozcan);

Select Guide Rating

• Foreword (Feldman); Introduction (Vijay Narayanan, Martin M Frank and Alex Demkov); Semiconductors on Si:Current Trends in Group-IV Semiconductor Epitaxy for Nanoelectronics (Jean-Michel Hartmann); Silicon Carbide on Silicon: 3C-SiC Buffer Layers for GaN LEDs (Jessica Chai, Li Wang and Sima Dimitrijev); Epitaxy of GaN on Silicon (Yu Cao, Satyaki Ganguly, Grace (Huili) Xing and Debdeep Jena); III-V Semiconductors on Silicon: Arsenides and Phosphides for QWFETs and BJTs (Dmitri Lubyshev); Dielectrics on Si:Organosilicates on Si: Low-k Dielectrics for MOSFET Interconnect Insulation (Mikhail R Baklanov, Kris Vanstreels, Chen Wu, Yunlong Li and Kristof Croes); Silicon Nitride on Si: Electronic Structure of Traps for Flash Memory (Vladimir A Gritsenko); High-k Oxides on Si: MOSFET Gate Dielectrics (Takashi Ando, Unoh Kwon, Siddarth Krishnan, Martin M Frank and Vijay Narayanan); Materials for DRAM Memory Cell Applications (Uwe Schroeder and Stefan Slesazeck); Electro-Optically Active Oxides on Silicon for Photonics (Stefan Abel and Jean Fompeyrine); Metals on Si:Silicides on Si: MOSFET Contacts (Ahmet S Ozcan);