Alberto Luceño – författare

Praise for the First Edition"This book . . . is a significant addition to the literature on statistical practice . . . should be of considerable interest to those interested in these topics."—International Journal of ForecastingRecent research has shown that monitoring techniques alone are inadequate for modern Statistical Process Control (SPC), and there exists a need for these techniques to be augmented by methods that indicate when occasional process adjustment is necessary. Statistical Control by Monitoring and Adjustment, Second Edition presents the relationship among these concepts and elementary ideas from Engineering Process Control (EPC), demonstrating how the powerful synergistic association between SPC and EPC can solve numerous problems that are frequently encountered in process monitoring and adjustment.The book begins with a discussion of SPC as it was originally conceived by Dr. Walter A. Shewhart and Dr. W. Edwards Deming. Subsequent chapters outline the basics of the new integration of SPC and EPC, which is not available in other related books. Thorough coverage of time series analysis for forecasting, process dynamics, and non-stationary models is also provided, and these sections have been carefully written so as to require only an elementary understanding of mathematics. Extensive graphical explanations and computational tables accompany the numerous examples that are provided throughout each chapter, and a helpful selection of problems and solutions further facilitates understanding.Statistical Control by Monitoring and Adjustment, Second Edition is an excellent book for courses on applied statistics and industrial engineering at the upper-undergraduate and graduate levels. It also serves as a valuable reference for statisticians and quality control practitioners working in industry.