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E. Todd Ryan – författare

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1 produkter

  1. Qinghuang Lin, E. Todd Ryan, Wen-li Wu, Do Yeung Yoon - Materials, Processes, Integration and Reliability in Advanced Interconnects for Micro- and Nanoelectronics: Volume 990, Häftad. Tillgänglighet: Lägg i varukorg

    Materials, Processes, Integration and Reliability in Advanced Interconnects for Micro- and Nanoelectronics: Volume 990

    Symposium Held April 10-12, 2007, San Francisco, California, U.S.A.

    Av Qinghuang Lin, E. Todd Ryan m. fl.

    Häftad, 2014

    471 kr

    Lägg i varukorg

    In 2004, the microelectronics industry quietly ushered in the Nanoelectronics Era with the mass production of sub-100nm node devices. The current leading-edge semiconductor chips in mass production - the so-called 90nm node devices - have a transistor gate length of less than 50nm. This rapid …