O. Auciello – författare

An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.

The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above.The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.

Electroceramic thin films hold out the promise of applications in entirely new generations of advanced microdevices that may revolutionize technology, creating multibillion dollar markets in the process. Less glamorous than the high-temperature superconductors, but probably just as important, are electrically conductive, ferroelectric, piezoelectric, pyroelectric, electro-optic and magnetic films. The list of potential applications of films having these properties is virtually endless, but there are still some issues to be resolved before fully functioning devices reach the market. All these issues and more are discussed in this work.

The basic and applied science of electroceramic thin films constitute one of the fast interdisciplinary evolving fields of research worldwide. A major driving force for the extensive research being performed in many Universities and Industrial and National Laboratories is the promise of applications of electroceramic thin ftlms into a whole new generation of advanced microdevices that may revolutionize various technologies and create new multibillion dollar markets. Properties of electroceramic thin films that are being intensively investigated include electrical conductivity, ferroelectricity, piezoelectricity, pyroelectricity, electro-optic activity, and magnetism. Perhaps the most publicized application of electroceramics is that related to the new high temperature superconducting (HTSC) materials, which has been extensively discussed in numerous national and international conferences, including NATO/ASI's and ARW's. Less glamorously publicized applications, but as important as those of HTSC materials, are those involving the other properties mentioned above, which were the subject of this ARW. Investigation on ferroelectric thin films has experienced a tremendous development in recent years due to the advent of sophisticated film synthesis techniques and a substantial improvement in the understanding of the related materials science and implementation of films in various novel devices. A major driving force behind the progress in this interdisciplinary field of research is the promise of the development of a new generation of non-volatile memories with long endurance and fast access time that can overcome the problems encountered in the semiconductor non-volatile memory of ferroelectric materials as high technology.

An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.

The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices.This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films.The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.

An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.