V.K. Jain – författare

Higher circuit densities, increasingly more complex application ohjectives, and advanced packaging technologies have suhstantially increased the need to incorporate defect-tolerance and fault-tolerance in the design of VLSI and WSI systems. The goals of defect-tolerance and fault-tolerance are yield enhancement and improved reliahility. The emphasis on this area has resulted in a new field of interdisciplinary scientific research. I n fact, advanced methods of defect/fault control and tolerance are resulting in enhanced manufacturahility and productivity of integrated circuit chips, VI.SI systems, and wafer scale integrated circuits. In 1987, Dr. W. Moore organized an "International Workshop on Designing for Yield" at Oxford University. Edited papers of that workshop were published in reference [II. The participants in that workshop agreed that meetings of this type should he con­ tinued. preferahly on a yearly hasis. It was Dr. I. Koren who organized the "IEEE Inter national Workshop on Defect and Fault Tolerance in VLSI Systems" in Springfield Massachusetts the next year. Selected papers from that workshop were puhlished as the first volume of this series [21.

Increased demand for and developments in micromanufacturing have created a need for a resource that covers both the science and technology of this rapidly growing area. With contributions from eminent professors and researchers actively engaged in teaching, research, and development, Micromanufacturing Processes details the basic principles, tools,

Increased demand for and developments in micromanufacturing have created a need for a resource that covers both the science and technology of this rapidly growing area. With contributions from eminent professors and researchers actively engaged in teaching, research, and development, Micromanufacturing Processes details the basic principles, tools, techniques, and latest advances in micromanufacturing processes. It includes coverage of measurement techniques and research trends as well as a large number of cross-references, making it useful to the students and researchers alike.The book outlines the challenges faced not only in micromanufacturing but also in meso- and nanomanufacturing, exploring topics such as micromachining, micro welding, microforming, micromolding, nanofinishing and micro-/nano-metrology. It includes examples that demonstrate the capabilities of fabricating micro- / nano-products and micro- / nano-features on the macro and micro products. The text also discusses nanofinishing techniques giving surface finish in the domain of sub-nano level, micro welding techniques, namely, laser beam micro welding, electron beam micro welding, micro / nano patterning in large quantities, and micro / nano metrology principles and equipments. It goes on to describe devices such as nano spring, micro mixer, micro cantilever, to name just a few.Unique in its level of coverage, the book highlights new challenges in manufacturing and covers several different types of micromanufacturing processes, such as micromachining, microforming, microcasting, microjoining, nanofinishing, and micrometrology. The level of details, extensive references, figures, and diagrams make the book a reference that will become the standard for this field.

Increased demand for and developments in micromanufacturing have created a need for a resource that covers both the science and technology of this rapidly growing area. With contributions from eminent professors and researchers actively engaged in teaching, research, and development, Micromanufacturing Processes details the basic principles, tools, techniques, and latest advances in micromanufacturing processes. It includes coverage of measurement techniques and research trends as well as a large number of cross-references, making it useful to the students and researchers alike.The book outlines the challenges faced not only in micromanufacturing but also in meso- and nanomanufacturing, exploring topics such as micromachining, micro welding, microforming, micromolding, nanofinishing and micro-/nano-metrology. It includes examples that demonstrate the capabilities of fabricating micro- / nano-products and micro- / nano-features on the macro and micro products. The text also discusses nanofinishing techniques giving surface finish in the domain of sub-nano level, micro welding techniques, namely, laser beam micro welding, electron beam micro welding, micro / nano patterning in large quantities, and micro / nano metrology principles and equipments. It goes on to describe devices such as nano spring, micro mixer, micro cantilever, to name just a few.Unique in its level of coverage, the book highlights new challenges in manufacturing and covers several different types of micromanufacturing processes, such as micromachining, microforming, microcasting, microjoining, nanofinishing, and micrometrology. The level of details, extensive references, figures, and diagrams make the book a reference that will become the standard for this field.

Increased demand for and developments in micromanufacturing have created a need for a resource that covers both the science and technology of this rapidly growing area. With contributions from eminent professors and researchers actively engaged in teaching, research, and development, Micromanufacturing Processes details the basic principles, tools,

Higher circuit densities, increasingly more complex application ohjectives, and advanced packaging technologies have suhstantially increased the need to incorporate defect-tolerance and fault-tolerance in the design of VLSI and WSI systems. The goals of defect-tolerance and fault-tolerance are yield enhancement and improved reliahility. The emphasis on this area has resulted in a new field of interdisciplinary scientific research. I n fact, advanced methods of defect/fault control and tolerance are resulting in enhanced manufacturahility and productivity of integrated circuit chips, VI.SI systems, and wafer scale integrated circuits. In 1987, Dr. W. Moore organized an "International Workshop on Designing for Yield" at Oxford University. Edited papers of that workshop were published in reference [II. The participants in that workshop agreed that meetings of this type should he con­ tinued. preferahly on a yearly hasis. It was Dr. I. Koren who organized the "IEEE Inter national Workshop on Defect and Fault Tolerance in VLSI Systems" in Springfield Massachusetts the next year. Selected papers from that workshop were puhlished as the first volume of this series [21.

Higher circuit densities, increasingly more complex application ohjectives, and advanced packaging technologies have suhstantially increased the need to incorporate defect-tolerance and fault-tolerance in the design of VLSI and WSI systems. The goals of defect-tolerance and fault-tolerance are yield enhancement and improved reliahility. The emphasis on this area has resulted in a new field of interdisciplinary scientific research. I n fact, advanced methods of defect/fault control and tolerance are resulting in enhanced manufacturahility and productivity of integrated circuit chips, VI.SI systems, and wafer scale integrated circuits. In 1987, Dr. W. Moore organized an "International Workshop on Designing for Yield" at Oxford University. Edited papers of that workshop were published in reference [II. The participants in that workshop agreed that meetings of this type should he con­ tinued. preferahly on a yearly hasis. It was Dr. I. Koren who organized the "IEEE Inter national Workshop on Defect and Fault Tolerance in VLSI Systems" in Springfield Massachusetts the next year. Selected papers from that workshop were puhlished as the first volume of this series [21.

This book provides an in-depth understanding of free space optical (FSO) communication with a particular emphasis on optical beam propagation through atmospheric turbulence. The book is structured in such a way that it provides a basic framework for the beginners and also gives a concise description from a designer’s perspective. The book provides an exposure to FSO technology, fundamental limitations, design methodologies, system trade-offs, acquisition, tracking and pointing (ATP) techniques and link-feasibility analysis. The contents of this book will be of interest to professionals and researchers alike. The book may also be used as a textbook for engineering coursework and professional training.

This book provides an in-depth understanding of free space optical (FSO) communication with a particular emphasis on optical beam propagation through atmospheric turbulence. The book is structured in such a way that it provides a basic framework for the beginners and also gives a concise description from a designer’s perspective. The book provides an exposure to FSO technology, fundamental limitations, design methodologies, system trade-offs, acquisition, tracking and pointing (ATP) techniques and link-feasibility analysis. The contents of this book will be of interest to professionals and researchers alike. The book may also be used as a textbook for engineering coursework and professional training.