V.N. Tsytovich - Böcker

This text presents all the basic considerations relevant to the topic of modulational interactions in plasmas. It adopts a simple and universal approach based on new methods developed for the description of modulation interactions in arbitrary media. Emphasis is given to the role of modulating interactions in fundamental topics, such as laser acceleration, the generation of strong magnetic fields, rf plasma heating and current drive, physical phenomena in active geophysical and space experiments, interactions of rf radiation with the ionosphere, and so on. The methods employed can also be applied to other areas of physics. The book is intended for researchers in plasma and laser physics, and nonlinear optics.

This book was written by a group of authors and provides a systematic dis­ cussion of questions related to bremsstrahlung in many-particle systems. A number of new results have recently been obtained in this area which require a fundamental revision of the previously existing traditional concepts of bremsstrahlung. This ap­ plies both to complicated atoms containing a large number of electrons and to the additional bremsstrahlung in a system of many particles forming a medium. In fact, the traditional approach was rigorously applicable only either to isolated "structureless" particles (e. g. , to the emission of an electron on a proton) or to par­ ticles radiating in the limit of extremely high frequencies. Polarization effects (either polarization of an atom itself by an incident particle or polarization of the medium surrounding an atomic particle) have a significant effect in the practically important optical and x-ray frequency ranges and sometimes even predominate. The first effect has come to be known as polarization atomic (or dynamic) bremsstrahlung and the second, as polarization transition bremsstrahlung. The au­ thors of this book use a single term: polarization bremsstrahlung. It seems that, in contrast to earlier ideas on the subject, bremsstrahlung during collisions of heavy incident particles with atoms is by no means small and is entirely caused by polar­ ization effects.

Complex plasmas are dusty plasmas in which the density and electric charges of the dust grains are sufficiently high to induce long-range grain-grain interactions, as well as strong absorption of charged-plasma components. Together with the sources replenishing the plasma such systems form a highly dissipative thermodynamically open system that exhibits many features of collective behaviour generally found in complex systems. Most notably among them are self-organized patterns such as plasma crystals, plasma clusters, dust stars and further spectacular new structures. Beyond their intrinsic scientific interest, the study of complex plasmas grows in importance in a great variety of fields, ranging from space-plasma sciences to applied fields such as plasma processing, thin-film deposition and even the production of computer chips by plasma etching, in which strongly interacting clouds of complex plasmas can cause major contamination of the final product.Intended as first introductory but comprehensive survey of this rapidly emerging field, the present book addresses postgraduate students as well as specialist and nonspecialist researchers with a general background in either plasma physics, space sciences or the physics of complex systems.

Complex plasmas are dusty plasmas in which the density and electric charges of the dust grains are sufficiently high to induce long-range grain-grain interactions, as well as strong absorption of charged-plasma components. Together with the sources replenishing the plasma such systems form a highly dissipative thermodynamically open system that exhibits many features of collective behaviour generally found in complex systems. Most notably among them are self-organized patterns such as plasma crystals, plasma clusters, dust stars and further spectacular new structures. Beyond their intrinsic scientific interest, the study of complex plasmas grows in importance in a great variety of fields, ranging from space-plasma sciences to applied fields such as plasma processing, thin-film deposition and even the production of computer chips by plasma etching, in which strongly interacting clouds of complex plasmas can cause major contamination of the final product.Intended as first introductory but comprehensive survey of this rapidly emerging field, the present book addresses postgraduate students as well as specialist and nonspecialist researchers with a general background in either plasma physics, space sciences or the physics of complex systems.