Zheng Cui – författare

Solution Processed Metal Oxide Thin Films for Electronic Applications discusses the fundamentals of solution processing materials chemistry techniques as they are applied to metal oxide materials systems for key device applications. The book introduces basic information (materials properties, materials synthesis, barriers), discusses ink formulation and solution processing methods, including sol-gel processing, surface functionalization aspects, and presents a comprehensive accounting on the electronic applications of solution processed metal oxide films, including thin film transistors, photovoltaic cells and other electronics devices and circuits.

This is an important reference for those interested in oxide electronics, printed electronics, flexible electronics and large-area electronics.

Provides in-depth information on solution processing fundamentals, techniques, considerations and barriers combined with key device applications Reviews important device applications, including transistors, light-emitting diodes, and photovoltaic cells Includes an overview of metal oxide materials systems (semiconductors, nanomaterials and thin films), addressing materials synthesis, properties, limitations and surface aspects

This book provides an overview of the newly emerged and highly interdisciplinary field of printed electronics Provides an overview of the latest developments and research results in the field of printed electronicsTopics addressed include: organic printable electronic materials, inorganic printable electronic materials, printing processes and equipments for electronic manufacturing, printable transistors, printable photovoltaic devices, printable lighting and display, encapsulation and packaging of printed electronic devices, and applications of printed electronicsDiscusses the principles of the above topics, with support of examples and graphic illustrationsServes both as an advanced introductory to the topic and as an aid for professional development into the new fieldIncludes end of chapter references and links to further reading

Nanofabrication: Principles, Capabilities and Limits presents a one-stop description at the introductory level on most technologies that have been developed which are capable of making structures below 100nm.Principles of each technology are introduced and illustrated with minimum mathematics involved. The capabilities of each technology in making sub-100nm structures are described. The limits of preventing a technology from further going down the dimensional scale are analyzed.Drawing upon years of practical experience and using numerous examples, Zheng Cui covers state-of-the art technologies in nanofabrication including:Photon-based lithographyCharged particle beams lithographyNanofabrication using scanning probesNanoscale replicationNanoscale pattern transferIndirect nanofabricationNanofabrication by self-assemblyNanofabrication: Principles, Capabilities and Limits will serve as a practical guide and first-hand reference for researchers and practitioners working in nanostructure fabrication and also provides a "tool box" of various techniques that can be easily adapted in different fields of applications.Written for: Nanoscience and nanotechnology researchers and engineers, technical professionals and academic researchers in the fields of electrtonics, mechanical engineering, and chemical engineering.

Nanofabrication: Principles, Capabilities, and Limits provides a practical guide to nanofabrication technologies and processes. It was first published in 2008 and is now in an updated third edition. The book introduces readers to the fundamentals and recent developments in nanofabrication techniques, with chapters covering optical lithography, electron beam lithography, and nanoimprinting lithography, as well as nanofabrication by focused ion beams, scanning tips, self-assembly, and nanoscale pattern transfer by etching and deposition. There is also a chapter describing various tricks that enable the fabrication of nanostructures that would otherwise be impossible using traditional methods. The unique feature of this book is that each technique introduced is not only about its capabilities but also its limits so that the readers are fully aware of the best options to choose from a toolbox of nanofabrication processes covered in the book.

Nanofabrication: Principles, Capabilities, and Limits provides a practical guide to nanofabrication technologies and processes. It was first published in 2008 and is now in an updated third edition. The book introduces readers to the fundamentals and recent developments in nanofabrication techniques, with chapters covering optical lithography, electron beam lithography, and nanoimprinting lithography, as well as nanofabrication by focused ion beams, scanning tips, self-assembly, and nanoscale pattern transfer by etching and deposition. There is also a chapter describing various tricks that enable the fabrication of nanostructures that would otherwise be impossible using traditional methods. The unique feature of this book is that each technique introduced is not only about its capabilities but also its limits so that the readers are fully aware of the best options to choose from a toolbox of nanofabrication processes covered in the book.

This second edition of Nanofabrication is one of the most comprehensive introductions on nanofabrication technologies and processes. Also analyzed are the capabilities of each technology in making sub-100nm structures, and the limits of preventing a technology from going further down the dimensional scale.