Ivo Utke is Vice Head of the Laboratory for Mechanics of Materials and Nanostructures at EMPA, The Swiss Federal Laboratories for Materials Testing and Research.Stanislav Moshkalev is Head of the Nanotechnology Group at the Center for Semiconductor Components, UNICAMP, Campinas, Brazil. Phillip E. Russell is Distinguished Professor of Science Education and Physics in the Department of Physics and Astronomy, Appalachian State University.

The first part of the book includes eight chapters and occupies roughly one-third of the book, whilst the second part incorporates about 20 chapters and takes up about two-thirds of the book. Such a distribution of material ensures that the basic concepts of these technologies are thoroughly explained ... In a word, one would aver that the volume contains essentially everything one would need to gain a deep understanding of the topics and probably a little more besides.

• Introduction ; I-1. Historical development of electron beam induced deposition and etching: from carbon to functional materials ; I. Utke, H. Koops ; I-2. Historical evolution of FIB technology: from circuit editing to nanoprototyping ; Ph. Russell. ; Part I. Fundamentals and Models ; 1. The theory of bright field electron and field ion emission sources ; R.Forbes ; 2. How to select compounds for focused charged particle beam assisted etching and deposition ; Tristan Bret, Patrik Hoffmann ; 3. Gas Injection Systems for FEB and FIB Processing: Theory and Experiment ; Vinzenz Friedli, Heinz D. Wanzenboeck, and Ivo Utke ; 4. Fundamentals of interactions of electrons with molecules ; John H. Moore, Petra Swiderek, Stefan Matejcik, Michael Allan ; 5. Simulation of focused ion beam milling ; Heung-Bae Kim, Gerhard Hobler ; 6. FEB and FIB continuum models for one molecule species ; Ivo Utke ; 7. Continuum modeling of electron beam induced processes ; Charlene J. Lobo and Milos Toth ; 8. Monte Carlo method in EBID process Beam

Ivo Utke is Vice Head of the Laboratory for Mechanics of Materials and Nanostructures at EMPA, The Swiss Federal Laboratories for Materials Testing and Research.Stanislav Moshkalev is Head of the Nanotechnology Group at the Center for Semiconductor Components, UNICAMP, Campinas, Brazil. Phillip E. Russell is Distinguished Professor of Science Education and Physics in the Department of Physics and Astronomy, Appalachian State University.

The first part of the book includes eight chapters and occupies roughly one-third of the book, whilst the second part incorporates about 20 chapters and takes up about two-thirds of the book. Such a distribution of material ensures that the basic concepts of these technologies are thoroughly explained ... In a word, one would aver that the volume contains essentially everything one would need to gain a deep understanding of the topics and probably a little more besides.

• Introduction ; I-1. Historical development of electron beam induced deposition and etching: from carbon to functional materials ; I. Utke, H. Koops ; I-2. Historical evolution of FIB technology: from circuit editing to nanoprototyping ; Ph. Russell. ; Part I. Fundamentals and Models ; 1. The theory of bright field electron and field ion emission sources ; R.Forbes ; 2. How to select compounds for focused charged particle beam assisted etching and deposition ; Tristan Bret, Patrik Hoffmann ; 3. Gas Injection Systems for FEB and FIB Processing: Theory and Experiment ; Vinzenz Friedli, Heinz D. Wanzenboeck, and Ivo Utke ; 4. Fundamentals of interactions of electrons with molecules ; John H. Moore, Petra Swiderek, Stefan Matejcik, Michael Allan ; 5. Simulation of focused ion beam milling ; Heung-Bae Kim, Gerhard Hobler ; 6. FEB and FIB continuum models for one molecule species ; Ivo Utke ; 7. Continuum modeling of electron beam induced processes ; Charlene J. Lobo and Milos Toth ; 8. Monte Carlo method in EBID process Beam

Ivo Utke is Vice Head of the Laboratory for Mechanics of Materials and Nanostructures at EMPA, The Swiss Federal Laboratories for Materials Testing and Research.Stanislav Moshkalev is Head of the Nanotechnology Group at the Center for Semiconductor Components, UNICAMP, Campinas, Brazil. Phillip E. Russell is Distinguished Professor of Science Education and Physics in the Department of Physics and Astronomy, Appalachian State University.

The first part of the book includes eight chapters and occupies roughly one-third of the book, whilst the second part incorporates about 20 chapters and takes up about two-thirds of the book. Such a distribution of material ensures that the basic concepts of these technologies are thoroughly explained ... In a word, one would aver that the volume contains essentially everything one would need to gain a deep understanding of the topics and probably a little more besides.

• Introduction ; I-1. Historical development of electron beam induced deposition and etching: from carbon to functional materials ; I. Utke, H. Koops ; I-2. Historical evolution of FIB technology: from circuit editing to nanoprototyping ; Ph. Russell. ; Part I. Fundamentals and Models ; 1. The theory of bright field electron and field ion emission sources ; R.Forbes ; 2. How to select compounds for focused charged particle beam assisted etching and deposition ; Tristan Bret, Patrik Hoffmann ; 3. Gas Injection Systems for FEB and FIB Processing: Theory and Experiment ; Vinzenz Friedli, Heinz D. Wanzenboeck, and Ivo Utke ; 4. Fundamentals of interactions of electrons with molecules ; John H. Moore, Petra Swiderek, Stefan Matejcik, Michael Allan ; 5. Simulation of focused ion beam milling ; Heung-Bae Kim, Gerhard Hobler ; 6. FEB and FIB continuum models for one molecule species ; Ivo Utke ; 7. Continuum modeling of electron beam induced processes ; Charlene J. Lobo and Milos Toth ; 8. Monte Carlo method in EBID process Beam