Handbook of Silicon Based MEMS Materials and Technologies

Markku Tilli obtained a degree in Materials Science (Physical Metallurgy) at Helsinki University of Technology (HUT) in 1974. Until 1980 he had various research and teaching positions at HUT specializing in crystal growth technologies. From 1981 to 1984 he managed process research and development in Silicon project at HUT silicon wafer manufacturing pilot plant. Since 1985 he has had various managing positions at Okmetic in research, development and customer support areas, and held a position of Senior Vice President, Research until his retirement in 2018. His MEMS related activities started in 1982 when he developed a process to make double side polished silicon wafers for bulk micromachined sensors. Since then he has developed advanced new silicon wafer types for MEMS, including special epitaxial wafers, SOI and SOI wafers with buried cavities. His publication topics include oxygen precipitation in silicon, silicon crystal growth, wafer cleaning as well as silicon wafer manufacturing technologies and applications in MEMS. He is member of the Technology Academy of Finland and has received the honorary degree of Doctor of Science in Engineering from Aalto University. Dr. Mervi Paulasto-Kröckel is professor at Aalto University School of Electrical Engineering in Finland. She studied materials science and semiconductor technology in Helsinki University of Technology, and gradudated as MSc Tech in 1990. She continued her studies in the Technical Universities of Aachen (RWTH Aachen) and Helsinki and attained her doctoral degree in 1995. After a 2-years post-doctoral appointment at the Joint Research Centre of European Commission in the Netherlands, her professional career continued in the electronics industry. She was a Staff Principal Engineer at Motorola Semiconductor Products Sector in Munich. In 2004 Paulasto-Kröckel joined Infineon Technologies where she was the Director Package Development responsible for semiconductor assembly and interconnect development for automotive products worldwide.At the end of 2018 Dr. Paulasto-Kröckel became a professor at Helsinki University of Technology, which is now called Aalto University after a merger with two other leading universities in the Helsinki area. Her current research focus is on advanced materials and interconnect technologies for MEMS/NEMS and power electronics, as well as multi-material assemblies behavior under different loads and their characteristic failure mechanisms. Her group has extensive experience in studying interactions and interfacial reactions between dissimilar materials, such as different oxide and nitride materials, metals and semiconductors. The group has developed a combined methodology approach to solve multi-materials compatibility issues in microelectronics and microsystems. Prof. Paulasto-Kröckel has over 110 international publications in the fields of microelectronics packaging and interfacial compatibility of dissimilar materials. She is IEEE EPS Distinguished Lecturer and a member of the Finnish Academy of Technical Sciences. Teruaki Motooka received PhD degree in 1981 in Applied Physics from Kyushu University. He was a research scientist in the Central Research Laboratory, Hitachi Ltd. for 1971-1984, a visiting research assistant professor at University of Illinois at Urbana-Champaign, USA for 1984-1988, an associate professor in the Institute of Applied Physics at University of Tsukuba, Japan for 1988-1993, and became a full professor at Kyushu University in 1993. He retired from Kyushu University in 2010.He has published more than 150 scientific papers on various international journals and these papers have been cited more than 2000 times. Veikko Lindroos is Professor Emeritus, Physical Metallurgy and Materials Science, Aalto University, Finland. His research covers a broad spectrum of materials science and technology, such as metallic materials, silicon technology and MEMS materials magnetic, electronic and composite materials as well as shape memory effect and materials.

• Impact of Silicon MEMSSection I: Silicon as MEMS Material1. Properties of Silicon2. Czochralski Growth of SiliconCrystals3. Properties of Silicon Crystals4. Silicon Wafers: Preparation and Properties5. Epi Wafers: Preparation and Properties6. Thin Films on Silicon6.1 Thin films on Silicon: Silicon dioxide6.2 Thin films on Silicon: Silicon nitride6.3 Thin Films on Silicon: Poly-Si and SiGe6.4 Thin films on Silicon: AlD6.5 Thin Films on Silicon: Piezofilms6.6 Thin Films on Silicon: Metal films7. Thick-Film SOI Wafers: Preparation and PropertiesSection II: Modeling in MEMS 8. Multiscale Modeling Methods9. Mechanical Properties of Silicon Microstuctures10. Electrostatic and RF-properties of MEMS Structures11. Optical Modeling of MEMS12. Simulations of Etching Processes for MEMS Fabrication13. Gas Damping in Vibrating MEMS StructuresSection III: Measuring MEMS 14. Introduction to Measuring MEMS15. Silicon Wafer and Thin Film Measurements16. Optical Measurement of Static and Dynamic Displacement in MEMS17. MEMS Residual Stress Characterization:  Methodology and Perspective18. Strength of Bonded Interfaces19. Oxygen and Bulk Microdefects in SiliconSection IV: Micromachining Technologies in MEMS20. MEMS Lithography21. Deep Reactive Ion Etching22. Wet Etching of Silicon23. Porous Silicon Based MEMS24. Surface Micromachining25. Vapour Phase Etch Processes for Silicon MEMS26. 2 3-D Printing for MEMS27. Microfluidics and Biomems in SiliconSection V: Encapsulation of MEMS Components28. Introduction to encapsulation of MEMS29. Silicon Direct Bonding30. Anodic Bonding31. Glass Frit Bonding32. Metallic Alloy Seal Bonding33. Bonding of CMOS Processed Wafers34. Wafer Bonding: Tools and Processes35. Encapsulation by Film Deposition36. Dicing of MEMS Devices37. 3D Integration of MEMS38. Via Technologies for MEMS39. Outgassing and Gettering40. Hermeticity Tests41. MEMS Reliability42. Appendix 1: Common Abbreviations and Acronyms43. Appendix 2: Nanoindentation Characterization of Silicon and other MEMS Materials