Ion-Beam-Based Nanofabrication: Volume 1020

Inbunden, Engelska, 2007

468 kr

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Beskrivning

It is increasingly apparent that ion-beam-based processing offers unique capabilities for fabrication and complex patterning of 3D, 2D or 1D structures at the few-nanometer scale (e.g., nanowires and quantum dots), and for custom tailoring of nanocomposites, nanoporous materials, catalyst surfaces, optical materials and nanoparticle assemblies. This book addresses achievements, applications and insights into such areas. It also seeks to identify potential dimensional limitations to the future practical implementation of this approach. Topics include: ion-beam nanofab - tools, techniques and applications; patterning, quantum dot synthesis and self assembly; and examples - applications and devices.

Produktinformation

Utgivningsdatum:2007-09-05
Mått:160 x 237 x 18 mm
Vikt:570 g
Format:Inbunden
Språk:Engelska
Serie:MRS Proceedings
Antal sidor:256
Förlag:Cambridge University Press
ISBN:9781558999800

Utforska kategorier

Innehållsförteckning

Preface; Part I. Ion Beam Nanofab: Tools, Techniques, and Applications: 1. Cluster ion beam process for nanofabrication; 2. Recent advances in FIB technology for nano-prototyping and nano-characterization; 3. Spatially resolved characterization of plastic deformation induced by focused-ion beam processing in structured InGaN/GaN layers; 4. Dynamics of ion beam stimulated surface mass transport to nanopores; 5. Ion beam lithography for nano-scale pattern features; 6. Ion-beam assist nano-texturing of films; 7. Swift heavy ion beam-based nanopatterning using self-assembled masks; 8. High-aspect-ratio micromachining of fluoropolymers using focused ion beam; 9. Resolution performance of programmable proximity aperture MeV ion beam lithography system; Part II. Patterning, Quantum Dot Synthesis, and Self Assembly: 10. Patterned adhesion of cells; 11. Nano-film and coating54l for biomedical application prepared by plasma-based technologies; 12. Modification of surface morphology of UHMWPE for biomedical implants; 13. Ion beam-induced quantum dot synthesis in glass; 14. Controlled growth of conducting carbon nanowires by ion irradiation: electrical and field emission properties; 15. Core-satellite metallic nanoclusters in silica obtained by multiple ion beam processing; 16. Pulsed low-energy ion-beam induced nucleation and growth of GE nanocrystals on SiO2; 17. Time evolution of nano dots created on InP(111) surfaces by keV irradiation; Part III. Examples: Applications and Devices: 18. Ion bombardment improvement on thermoelectric properties of multilayered Bi2Te3/Sb2Te3 deposited by magnetron sputtering; 19. Nanoscale surface modification of ultrahigh molecular weight polyethylene (UHMWPE) samples with the w + c ion implantation; 20. Irradiation effects of methanol cluster ion beams on solid surfaces; 21. Nano- and micro-structural evolution of UHMWPE by ion beam; 22. MeV ion-beam bombardment effects on the thermoelectric figures of merit of Zn4Sb3 and ZrNiSn-based half-Heusler compounds; 23. In vitro apatite formation on polymer substrates irradiated by the simultaneous use of oxygen cluster and monomer ion beams; 24. Fabrication of nanoscale gold clusters by low energy ion irradiation; 25. Fluence dependence of thermoelectric properties induced y ion bombardment of Zn4Sb3 and CeFe2Co2Sb12 thin films; 26. Effect of implantation dose and annealing time on the formation of Si nanocrystals embedded in thermal oxide; 27. Properties of nono-layers of nanoclusters of Ag in SiO2 host produced by MeV Si ion bombardment; 28. Effects of MeV Si ion bombardments on the properties of nano-layers of SiO2/SiO2+Zn4Sb3; 29. High resolution XRD studies of ion beam irradiated InGaAs/InP multi quantum wells; 30. Focused ion beam fabrication of individual carbon nanotube devices; 31. MeV ion beam fabrication of nanopores; Author index; Subject index.