Nanoimprint Technology

Jun Taniguchi, Tokyo University of Science, JapanJun Taniguchi is an Associate Professor in the Faculty of Industrial Science and Technology, at Tokyo University of Science in Japan. His research interests include electron beam lithography, nanoimprint lithography and nanotechnology.Hiroshi Ito, Yamagata University, JapanHiroshi Ito is a Professor in the Department of Polymer Science and Engineering at Yamagata University in Japan. He is a board member for the Japan Society of Polymer Processing and Society Plastics Engineers. His major field of research is to clarify and control the development of high-order structure in polymeric materials through experimental and theoretical studies on polymer processingJun Mizuno, Waseda University, JapanJun Mizuno is an Associate Professor in the Nanotechnology Research Laboratory at Waseda University in Japan. His research interests include nanomaterials and intelligent mechanics. Takushi Saito, Tokyo Institute of Technology, JapanTakushi Saito is an Associate Professor in the Department of Mechanical and Control Engineering at Tokyo Institute of Technology in Japan. His research interests include polymer processing, laser assisted manufacturing and micro-scale processing

• About of Editors ixList of Contributors xiSeries Preface xiiiPreface xv1 What is a Nanoimprint? 1Jun TaniguchiReferences 62 Nanoimprint Lithography: Background and Related Techniques 9Hiroshi Ito(1) and Takushi Saito2.1 History of Material Processing: Polymer Processing 92.2 Products with Microstructure and Nanostructure 112.3 Technology for Making Micro- and Nanostructures 12References 153 Nanopattern Transfer Technology of Thermoplastic Materials 17Takushi Saito and Hiroshi Ito(1)3.1 Behavior of Thermoplastic Materials 173.1.1 Thermoplastics 173.1.2 Basis of Viscoelasticity and Rheology 193.1.3 Measurement of Rheology 203.1.4 Physical Properties of Viscoelastic Materials and the Temperature–Time Superposition Principle 213.1.5 Materials Design for Realizing Nanoimprints 243.2 Applicable Processes Used for Nanopattern Transfer 253.2.1 Introduction of Injection Molding Process 253.2.2 Problems of the Injection Molding Process 283.2.3 Advantages of the Thermal Imprinting Process 293.3 Pattern Transfer Mechanism of Thermal Cycle NIL 303.3.1 Introduction of Thermal Imprinting Process 303.3.2 In-situ Observation of Thermal Imprinting Process 323.3.3 Offline Measurement of Replication Process in Thermal Cycle NIL 353.4 Modeling of Nanopattern Transfer 383.4.1 Importance of Viscosity in Thermal Imprinting Process 383.4.2 Mathematical Treatment in Injection Molding and Thermal Imprinting Process 413.4.3 Process Simulation in Micro- and Nanopattern Transfer 44References 48Mold Fabrication Process 51Mitsunori Kokubo, Gaku Suzuki, and Masao Otaki4.1 Ultra Precision Cutting Techniques Applied to Metal Molds Fabrication for Nanoimprint Lithography 514.1.1 Introduction 514.1.2 Cutting of Fine Groove Shape 524.1.3 Method of Cutting Groove 534.1.4 Precision Cutting of Cylindrical Material 554.1.5 High-speed, Ultra Precision Machining System 564.1.6 Fine Pattern Processing by Bit Map Data 584.1.7 Machining of Dot Pattern Array 584.1.8 Improvement Points of the System 614.1.9 Summary 624.2 Nanoimprint Mold Fabrication Using Photomask Technology 624.2.1 Introduction 624.2.2 Summary of Mold Manufacturing Process 634.2.3 Pattern Writing Technique 674.2.4 Dry Etching 814.2.5 Examples of Fabricated Mold 854.2.6 Summary 895 Ultraviolet Nanoimprint Lithography 91Jun Taniguchi, Noriyuki Unno, Hidetoshi Shinohara, Jun Mizuno, Hiroshi Goto, Nobuji Sakai, Kentaro Tsunozaki, Hiroto Miyake, Norio Yoshino, and Kenichi Kotaki5.1 Orientation and Background of UV-NIL 915.2 Transfer Mechanism of UV-NIL 955.2.1 Viscosity and Capillary Force 965.2.2 Release Coating and Evaluationof Release Properties 1005.2.3 Release Coating Effect 1035.3 UV-NIL Materials and Equipment 1065.3.1 Ubiquitous NIL Machines 1065.3.2 UV Nanoimprint Process Tool 1105.3.3 UV-photocurable Resin 1155.3.4 Fluorinated Polymers for UV-NIL 1215.3.5 Cationic Curable Resins for UV-NIL 1265.3.6 Molding Agents for Nanoimprinting 1375.4 Evaluation Method 1435.4.1 Macro Evaluation Technique of Nanoscale Pattern Shape and Evaluation Device 1435.4.2 Characterization of Photocurable Resin for UV Nanoimprint 149References 1656 Applications and Leading-Edge Technology 169Jun Taniguchi, Hidetoshi Shinohara, Jun Mizuno, Mitsunori Kokubo, Kazutoshi Yakemoto, and Hiroshi Ito(2)6.1 Advanced Nanoimprinting Technologies 1696.1.1 Resolution Limit of Nanoimprint Lithography 1706.1.2 Improved Nanoimprinting Technologies 1726.1.3 Roll-to-Roll Nanoimprinting Technologies 1746.2 Applications 1756.2.1 Seamless Pattern 1756.2.2 Multistep Cu Interconnection 1776.2.3 GaN Nanostructures for High-Intensity LED 1826.3 High-Accuracy Nanoimprint Technology, Development of Micropatterning Method, and Automatic Process Control Using Batch Press Type, Step and Repeat Type Nanoimprint Machine 1866.3.1 Introduction 1866.3.2 Thermal Imprint 1866.3.3 Summary 1946.4 Micro/Nano Melt Transcription Molding Process 1956.4.1 Outline of the Melt Transcription Molding Process 1956.4.2 High Transcriptability 1966.4.3 Excellent Optical Properties 2006.4.4 Melt Transcription Molding System ‘‘MTM100-15’’ 201Future Trends 202References 203